High-Repetition-Rate Projection Multiphoton Lithography for Large-Area Sub-Micron 3D Printing
Abstract
High-resolution lithographic techniques are often limited by low volumetric throughput, since there is no universal and scalable manufacturing process that can produce 3D metasurfaces. In this work, we demonstrate a high-speed holographic 3D printing platform based on spatiotemporal beam shaping, exceeding the repetition rate while keeping the resolution high. The system integrates a femtosecond laser source with a spectral pulse compressor and a beam shaper to project uniform, axially confined light fields to project patterns directly on the advanced photoresists using a Digital Micromirror Device DMD. We investigate the process window for rapid polymerization, optimizing the photoinitiator choice to eliminate thermal crosstalk at high repetition rates. Using this setup, we achieve a production throughput of more than a million voxels per second with sub-micron resolution below 400 nm. The system's reliability is validated through the fabrication of large-area woodpile-like lattices and uniform micropillar arrays, establishing a workflow for scalable manufacturing of micro-optical components.
Keywords
Cite
@article{arxiv.2601.17816,
title = {High-Repetition-Rate Projection Multiphoton Lithography for Large-Area Sub-Micron 3D Printing},
author = {Savvas Papamakarios and Maria Manousidaki and Michalis Stavrou and David Gray and Maria Farsari},
journal= {arXiv preprint arXiv:2601.17816},
year = {2026}
}