Related papers: Material-specific high-resolution table-top extrem…
We experimentally re-evaluate the fine structure of Sn$^{11+...14+}$ ions. These ions are essential in bright extreme-ultraviolet (EUV) plasma-light sources for next-generation nanolithography, but their complex electronic structure is an…
Coherent diffractive imaging is unique as the only route for achieving diffraction-limited spatial resolution in the extreme ultraviolet and X-ray regions, limited only by the wavelength of the light. Recently, advances in coherent short…
The lack of available table-top extreme ultraviolet (XUV) sources with high enough fluxes and coherence properties have limited the availability of nonlinear XUV and x-ray spectroscopies to free electron lasers (FEL). Here, we demonstrate…
Mask-based pattern generation is a crucial step in microchip production. The next-generation extreme-ultraviolet- (EUV) lithography instruments with a wavelength of \SI{13.5}{\nano\meter} is currently under development. In principle, this…
We present a table-top extreme ultraviolet (XUV) beamline for measuring time- and frequency-resolved XUV excited optical luminescence (XEOL) with additional femtosecond-resolution XUV transient absorption spectroscopy functionality. XUV…
A refined model of an extreme ultraviolet (EUV) mask stack consisting of the Mo/Si multilayer coated by a Ru protective layer and a TaBN/TaBO absorber layer was developed to facilitate accurate simulations of EUV mask performance for…
We present a table-top coherent diffraction imaging (CDI) experiment based on high-order harmonics generated at 18 nm by a high average power femtosecond fiber laser system. The high photon flux, narrow spectral bandwidth and high degree of…
Nonlinear spectroscopy in the extreme ultraviolet (EUV) and soft x-ray spectral range offers the opportunity for element selective probing of ultrafast dynamics using core-valence transitions (Mukamel et al., Acc. Chem. Res. 42, 553…
Ptychographic Coherent Diffractive Imaging enables diffraction-limited imaging of nanoscale structures at extreme ultraviolet and x-ray wavelengths, where high-quality image-forming optics are not available. However, its reliance on a set…
Coherent extreme ultraviolet (XUV) radiation produced by table-top high-harmonic generation (HHG) sources provides a wealth of possibilities in research areas ranging from attosecond physics to high resolution coherent imaging. However, it…
Non-destructive cross-sectional characterization of materials systems with a resolution in the nanometer range and the ability to allow for time-resolved in-situ studies is of great importance in material science. Here, we present such a…
The optical constants of ruthenium in the spectral range 8 nm to 23.75 nm with their corresponding uncertainties are derived from the reflectance of a sputtered ruthenium thin film in the Extreme Ultraviolet (EUV) spectral range measured…
We report a high-precision determination of the natural-abundance-averaged nuclear charge-radius difference between Yb and Lu using extreme ultraviolet (EUV) spectroscopy of highly charged ions (HCIs). By measuring the $D_1$ transition…
An experimental setup that directly reproduces Extreme UV-lithography relevant conditions for detailed component exposure tests is described. The EUV setup includes a pulsed plasma radiation source, operating at 13.5 nm; a debris mitigation…
Ptychography enables coherent diffractive imaging (CDI) of extended samples by raster scanning across the illuminating XUV/X-ray beam thereby generalizing the unique advantages of CDI techniques. Table-top realizations of this method are…
The absence of efficient light modulators for extreme ultraviolet (EUV) and X-ray photons significantly limits their real-life application, particularly when even slight complexity of the beam patterns is required. Here we report on a novel…
A custom, flat field, extreme ultraviolet EUV spectrometer built specifically for use with low power light sources that operate under ultrahigh vacuum conditions is reported. The spectral range of the spectrometer extends from 4 nm to 40…
Metasurfaces with spatially varying subwavelength structures enable full control of electromagnetic waves over a wide spectrum. High-efficiency metasurfaces, especially in a transmission mode, are of practical significance in optical…
A step towards a successful implementation of timeresolved digital in-line holography with extreme ultraviolet radiation is presented. Ultrashort XUV pulses are produced as high-order harmonics of a femtosecond laser and a Schwarzschild…
The dissociative photoionization of \textit{tert}-butyl methyl methacrylate, a monomer unit found in many ESCAP resists, was investigated in a gas phase photoelectron photoion coincidence experiment employing extreme ultraviolet (EUV)…