Related papers: Material-specific high-resolution table-top extrem…

Accelerator-based MeV ultrafast electron microscope (MUEM) has been proposed as a promising tool to study structural dynamics at the nanometer spatial scale and picosecond temporal scale. Here we report experimental tests of a prototype…

Two-dimensional heterostructures with layers of slightly different lattice vectors exhibit a new periodic structure known as moire lattices. Moire lattice formation provides a powerful new way to engineer the electronic structure of…

Circularly-polarized extreme UV and X-ray radiation provides valuable access to the structural, electronic and magnetic properties of materials. To date, this capability was available only at large-scale X-ray facilities such as…

One of the frontiers in electron scattering is to couple ultrafast temporal resolution with highly localized probes to investigate the role of microstructure on material properties. Here, taking advantage of the unprecedented average…

Using the illuminator for high numerical aperture (NA) extreme ultraviolet (EUV) exposure tool in EUV lithography can lead to support volume production of sub-2 nm logic nodes and leading-edge DRAM nodes. However, the typical design method…

One of the major discoveries of the Extreme ultraviolet Imaging Telescope (EIT) on SOHO were intensity enhancements propagating over a large fraction of the solar surface. The physical origin(s) of the so-called `EIT' waves is still…

It has been a general trend to develop low-voltage electron microscopes due to their high imaging contrast of the sample and low radiation damage. Atom-resolved transmission electron microscopes with voltages as low as 15-40 kV have been…

For many applications of extreme ultraviolet (XUV) and x-ray pulses a small focus size is crucial to reach the required intensity or spatial resolution. In this article, we present a simple way to characterize an XUV focus with a resolution…

We report on the development of a high-order harmonic generation (HHG)-based ultrafast high-repetition-rate (250 kHz) monochromatic extreme ultraviolet (21.6 eV) source with polarization tunability, specifically designed for multi-modal…

Time- and Angle-resolved photoelectron spectroscopy from surfaces can be used to record the dynamics of electrons and holes in condensed matter on ultrafast time scales. However, ultrafast photoemission experiments using extreme-ultraviolet…

We report the first direct demonstration of possibility to generate the extreme ultraviolet (EUV) radiation with a freely expanding jet of dense plasma with multiply-charged ions supported by high-power microwaves. The detected emission…

Unraveling and controlling chemical dynamics requires techniques to image structural changes of molecules with femtosecond temporal and picometer spatial resolution. Ultrashort-pulse x-ray free-electron lasers have significantly advanced…

High-resolution Fourier-transform spectroscopy using table-top sources in the extreme ultraviolet (XUV) spectral range is still in its infancy. In this contribution a significant advance is presented based on a Michelson-type all-reflective…

Reflective ptychography is a promising lensless imaging technique with a wide field of view, offering significant potential for applications in semiconductor manufacturing and detection. However, many semiconductor materials are coated with…

Plane-parallel resonator configuration is proposed for high-NA EUV lithography, where the lithography mask and the wafer are parallelly arranged through two focusing mirrors. EUV light is injected through an off-axis rotating mirror at the…

A high-performance fast response deep ultraviolet (UV) photodetectors with interdigitated Ti/Au planar electrodes using a lithography technology has fabricated on homoepitaxial diamond. The device shows a high ultraviolet photocurrent at…

Superconducting NbN wires have recently received attention as detectors for visible and infrared photons. We present experiments in which we use a NbN wire for high-efficiency (40 %) detection of single electrons with keV energy. We use the…

Extreme Ultraviolet (EUV) waves have been found for about 15 years. However, significant controversy remains over their physical natures and origins. In this paper, we report an EUV wave that was accompanied by an X1.9 flare and a partial…

Higher resolution demands for semiconductor lithography may be fulfilled by higher numerical aperture (NA) systems. However, NAs more than the photoresist refractive index (~1.7) cause surface confinement of the image. In this letter we…

The shape of the UV ionizing background is reconstructed from optically thin metal absorption-line systems identified in spectra of HE2347-4342, Q1157+3143, and HS1700+6416 in the redshift interval 1.8 < z < 2.9. The systems are analyzed by…