Related papers: Material-specific high-resolution table-top extrem…
We present the results of spectroscopic measurements in the extreme ultraviolet (EUV) regime (7-17 nm) of molten tin microdroplets illuminated by a high-intensity 3-J, 60-ns Nd:YAG laser pulse. The strong 13.5 nm emission from this…
We developed a table-top vacuum ultraviolet (VUV) laser with $113.778$nm wavelength (10.897eV) and demonstrated its viability as a photon source for high resolution angle-resolved photoemission spectroscopy (ARPES). This sub-nanosecond…
Ultra-fast transmission electron microscopy (UTEM) combines sub-picosecond time-resolution with the versatility of TEM spectroscopies. It allows one to study the dynamics of materials properties combining complementary techniques. However,…
Characterizing buried layers and interfaces is critical for a host of applications in nanoscience and nano-manufacturing. Here we demonstrate non-invasive, non-destructive imaging of buried interfaces using a tabletop, extreme ultraviolet…
We demonstrate a method to image an object using a self-probing approach based on semiconductor high-harmonic generation. On one hand, ptychography enables high-resolution imaging from the coherent light diffracted by an object. On the…
High-intensity laser pulses covering the ultraviolet to terahertz spectral regions are nowadays routinely generated in a large number of laboratories. In contrast, intense extreme-ultraviolet (XUV) pulses have only been demonstrated using a…
Extreme Ultraviolet (EUV) lithography is the newest technology that will be used in the semiconductor industry for printing circuitry in the sub-20 nm scale. Low-energy electrons (LEEs) produced upon illumination of resist materials with…
Ultrafast Electron Microscopy (UEM) has been demonstrated to be an effective table-top technique for imaging the temporally-evolving dynamics of matter with subparticle spatial resolution on the time scale of atomic motion. However, imaging…
High harmonics generation (HHG) of coherent extreme ultraviolet (EUV) radiation enables ultrafast pump-probe spectroscopy with attosecond-scale timing resolutions. Yet beam control of generated EUV radiation remains a major challenge for…
A critical technology for high-volume manufacturing of nanoscale integrated circuits is a high-power extreme ultraviolet (EUV) light source. Over the past decades, laser-produced plasma (LPP) sources have been actively utilized in this…
Size effects are ubiquitous in the structural, mechanical, and physical properties of materials, making it highly desirable to study the intrinsic properties of thick objects through high-resolution structural analysis in transmission…
Structured light has gained significant attention in recent years, especially in the generation and application of vector beams. These beams, characterized by a spatially varying polarization state, are a powerful tool to enhance our…
Electron ptychography describes a family of algorithms which are used to enable the reconstruction of complex specimen transmission functions of a sample in order to obtain both phase and amplitude information, as applied within the realms…
In this paper, a method for solving the initial structure of an off-axis multi-mirror system applied to extreme ultraviolet (EUV) lithography using a paraxial ray-tracing algorithm based on Seidel aberration theory is proposed. By tracing…
Perhaps surprisingly, the total electron microscopy (EM) data collected to date is less than a cubic millimeter. Consequently, there is an enormous demand in the materials and biological sciences to image at greater speed and lower dosage,…
The rapid development of coherent short-wavelength light sources in the extreme ultraviolet (EUV) and soft X-ray (SXR) regimes has created a growing need for advanced optoelectronic detection capabilities, particularly for…
Pulses of extreme ultraviolet (XUV) light, with wavelengths between 10 and 100$\,$nm, can be used to image and excite ultra-fast phenomena such as the motion of atomic electrons. Here we show that the illumination of plasma with…
A 790-nm-driven high-harmonic generation source with a repetition rate of 6 kHz is combined with a toroidal-grating monochromator and a high-detection-efficiency photoelectron time-of-flight momentum microscope to enable time- and…
The $\textrm{HRI}_\textrm{EUV}$ telescope was calibrated on ground at the Physikalisch-Technische Bundesanstalt (PTB), Germany's national metrology institute, using the Metrology Light Source (MLS) synchrotron in April 2017 during the…
We propose a near-cutoff parallel-plate waveguide haloscope for sub-meV dark matter. The concept retains the large-area openness of a dish antenna while providing cavity-like field enhancement through slow-wave response and coherent…