Related papers: Material-specific high-resolution table-top extrem…
We present spatial coherence measurements of extreme-ultraviolet light generated using the process of high-harmonic upconversion of a femtosecond laser. Using a phase-matched hollow-fiber geometry, the generated beam is found to exhibit…
Dynamic scattering and imaging with coherent, ultrafast, extreme ultraviolet (EUV) light sources can resolve charge, phonon and spin processes on their intrinsic length and time scales. However, full field coherent diffraction imaging…
A new tool providing material contrast control in scanning electron microscopy (SEM) is demonstrated. The approach is based on deep-UV illumination during SEM imaging and delivers a novel material based contrast as well as higher resolution…
In this work, we show the feasibility of extreme ultraviolet (EUV) patterning on an HF-treated Si(100) surface in the absence of a photoresist. EUV lithography is the leading lithography technique in semiconductor manufacturing due to its…
The study presented here was initiated by a discussion to investigate the possibility of using synchrotron radiation as a source for the Next Generation Lithography (NGL) based on the EUV-concept (Extreme Ultra-Violet; here 13.5 nm or 11.3…
We performed extreme ultraviolet spectroscopy using an 80 lines/mm TEM mesh as dispersive element. We present the usefulness of this instrument for dispersing a high harmonic spectrum from the 13th to the 29th harmonic of a Ti:Sapph laser,…
Aberration-corrected optics have made electron microscopy at atomic-resolution a widespread and often essential tool for nanocharacterization. Image resolution is dominated by beam energy and the numerical aperture of the lens ({\alpha}),…
Extreme ultraviolet (EUV) coherent sources below 120nm are of paramount significance for promoting next-generation nano-scale lithography,precision spectroscopy, and exploring the emerging physical phenomena in quantum materials. Nonlinear…
Pattern transfer by deep anisotropic etch is a well-established technique for fabrication of nanoscale devices and structures. For this technique to be effective, the resist material plays a key role and must have high resolution,…
Extreme ultraviolet (EUV) lithography has revolutionized high-volume manufacturing of nanoscale components, enabling the production of smaller, denser, and more energy efficient integrated circuit devices. Yet, the use of EUV light results…
Novel table-top sources of extreme-ultraviolet light based on high-harmonic generation yield unique insight into the fundamental properties of molecules, nanomaterials, or correlated solids, and enable advanced applications in imaging or…
We introduce a machine-learning-based approach to enhance the sensitivity of optical-extreme ultraviolet (XUV) transient absorption spectroscopy. A reference spectrum is used as input to a three-layer feed-forward neural network, allowing…
High-resolution extreme ultraviolet (XUV) imaging remains limited by conventional approaches that require complex optics such as multilayer mirrors and zone plates. These methods are expensive, suffer from chromatic aberrations and narrow…
High harmonic generation (HHG) enables coherent extreme-ultraviolet (XUV) radiation with ultra-short pulse duration in a table-top setup. This has already enabled a plethora of applications. Nearly all of these applications would benefit…
The relentless pursuit of understanding matter at ever-finer scales has pushed optical microscopy to surpass the diffraction limit and produced the super-resolution microscopy which enables visualizing structures shorter than the wavelength…
Self-diffraction is a non-collinear four-wave mixing technique well-known in optics. We explore self-diffraction in the extreme ultraviolet (EUV) range, taking advantage of intense femtosecond EUV pulses produced by a free electron laser.…
The development of extreme ultraviolet sources is critical for advancing angleresolved photoemission spectroscopy (ARPES), a powerful technique for probing the electronic structure of materials. Here, we report the construction of a…
Collective lattice dynamics determine essential aspects of condensed matter, such as elastic and thermal properties. These exhibit strong dependence on the length-scale, reflecting the marked wavevector dependence of lattice excitations.…
Increasing miniaturization and complexity of nanostructures require innovative metrology solutions with high throughput that can assess complex 3D structures in a non-destructive manner. EUV scatterometry is investigated for the…
Extreme ultraviolet (XUV) lasers are essential for the investigation of fundamental physics. Especially high repetition rate, high photon flux sources are of major interest for reducing acquisition times and improving signal to noise ratios…