Discharge-produced plasma extreme ultraviolet (EUV) source and ultra high vacuum chamber for studying EUV-induced processes
Plasma Physics
2015-06-18 v1 Instrumentation and Detectors
Abstract
An experimental setup that directly reproduces Extreme UV-lithography relevant conditions for detailed component exposure tests is described. The EUV setup includes a pulsed plasma radiation source, operating at 13.5 nm; a debris mitigation system; collection and filtering optics; and an UHV experimental chamber, equipped with optical and plasma diagnostics. The first results, identifying the physical parameters and evolution of EUV-induced plasmas are presented. Finally, the applicability and accuracy of the in situ diagnostics is briefly discussed.
Keywords
Cite
@article{arxiv.1411.4505,
title = {Discharge-produced plasma extreme ultraviolet (EUV) source and ultra high vacuum chamber for studying EUV-induced processes},
author = {A Dolgov and O Yakushev and A Abrikosov and E Snegirev and V M Krivtsun and C J Lee and F Bijkerk},
journal= {arXiv preprint arXiv:1411.4505},
year = {2015}
}
Comments
12 pages, 8 figures