English

Dielectric Engineered Tunnel Field-Effect Transistor

Mesoscale and Nanoscale Physics 2015-10-23 v1

Abstract

The dielectric engineered tunnel field-effect transistor (DE-TFET) as a high performance steep transistor is proposed. In this device, a combination of high-k and low-k dielectrics results in a high electric field at the tunnel junction. As a result a record ON-current of about 1000 uA/um and a subthreshold swing (SS) below 20mV/dec are predicted for WTe2 DE-TFET. The proposed TFET works based on a homojunction channel and electrically doped contacts both of which are immune to interface states, dopant fluctuations, and dopant states in the band gap which typically deteriorate the OFF-state performance and SS in conventional TFETs.

Keywords

Cite

@article{arxiv.1508.00453,
  title  = {Dielectric Engineered Tunnel Field-Effect Transistor},
  author = {Hesameddin Ilatikhameneh and Tarek A. Ameen and Gerhard Klimeck and Joerg Appenzeller and Rajib Rahman},
  journal= {arXiv preprint arXiv:1508.00453},
  year   = {2015}
}

Comments

3 pages, 3 figures

R2 v1 2026-06-22T10:25:06.303Z