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High performance Tunnel Field Effect Transistors based on in-plane transition metal dichalcogenide heterojunctions

Mesoscale and Nanoscale Physics 2018-11-14 v1 Computational Physics

Abstract

In-plane heterojunction tunnel field effect transistors based on monolayer transition metal dichalcogenides are studied by means of self-consistent non-equilibrium Green's functions simulations and an atomistic tight-binding Hamiltonian. We start by comparing several heterojunctions before focusing on the most promising ones, i.e WTe2-MoS2 and MoTe2-MoS2. The scalability of those devices as a function of channel length is studied, and the influence of backgate voltages on device performance is analysed. Our results indicate that, by fine-tuning the design parameters, those devices can yield extremely low sub-threshold swings (below 5mV/decade) and Ion/Ioff ratios higher than 1e8 at a supply voltage of 0.3V, making them ideal for ultra-low power consumption.

Keywords

Cite

@article{arxiv.1807.07128,
  title  = {High performance Tunnel Field Effect Transistors based on in-plane transition metal dichalcogenide heterojunctions},
  author = {Jean Choukroun and Marco Pala and Shiang Fang and Efthimios Kaxiras and Philippe Dollfus},
  journal= {arXiv preprint arXiv:1807.07128},
  year   = {2018}
}

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10 pages