相关论文: SemiFA: An Agentic Multi-Modal Framework for Auton…

Failure Analysis (FA) is a highly intricate and knowledge-intensive process. The integration of AI components within the computational infrastructure of FA labs has the potential to automate a variety of tasks, including the detection of…

Controlling defects in semiconductor processes is important for maintaining yield, improving production cost, and preventing time-dependent critical component failures. Electron beam-based imaging has been used as a tool to survey wafers in…

Vision-Language-Action (VLA) models have recently advanced robotic manipulation by translating natural-language instructions and visual observations into control actions. However, existing VLAs are primarily trained on successful expert…

With high device integration density and evolving sophisticated device structures in semiconductor chips, detecting defects becomes elusive and complex. Conventionally, machine learning (ML)-guided failure analysis is performed with offline…

Semiconductors, crucial to modern electronics, are generally under-researched in foundational models. It highlights the need for research to enhance the semiconductor device technology portfolio and aid in high-end device fabrication. In…

A growing need exists for efficient and accurate methods for detecting defects in semiconductor materials and devices. These defects can have a detrimental impact on the efficiency of the manufacturing process, because they cause critical…

With continuous progression of Moore's Law, integrated circuit (IC) device complexity is also increasing. Scanning Electron Microscope (SEM) image based extensive defect inspection and accurate metrology extraction are two main challenges…

Face anti-spoofing aims to discriminate the spoofing face images (e.g., printed photos) from live ones. However, adversarial examples greatly challenge its credibility, where adding some perturbation noise can easily change the predictions.…

Precision in identifying nanometer-scale device-killer defects is crucial in both semiconductor research and development as well as in production processes. The effectiveness of existing ML-based approaches in this context is largely…

Confirmatory factor analysis (CFA) is a statistical method for identifying and confirming the presence of latent factors among observed variables through the analysis of their covariance structure. Compared to alternative factor models, CFA…

Manufacturers struggle to produce low-cost, robust and complex components at manufacturing lot-size one. Additive processes like Fused Filament Fabrication (FFF) inexpensively produce complex geometries, but defects limit viability in…

We present WaferSAGE, a framework for wafer defect visual question answering using small vision-language models. To address data scarcity in semiconductor manufacturing, we propose a three-stage synthesis pipeline incorporating structured…

Slow Feature Analysis (SFA) extracts features representing the underlying causes of changes within a temporally coherent high-dimensional raw sensory input signal. Our novel incremental version of SFA (IncSFA) combines incremental Principal…

To address the challenges posed by cascading reactions caused by component failures in autonomous cargo ships (ACS) and the uncertainties in emergency decision-making, this paper proposes a novel hybrid feature fusion framework for…

We introduce a fast Self-adapting Forward-Forward Network (SaFF-Net) for medical imaging analysis, mitigating power consumption and resource limitations, which currently primarily stem from the prevalent reliance on back-propagation for…

Factor Analysis (FA) is a technique of fundamental importance that is widely used in classical and modern multivariate statistics, psychometrics and econometrics. In this paper, we revisit the classical rank-constrained FA problem, which…

Deep learning-based vulnerability detection has shown great performance and, in some studies, outperformed static analysis tools. However, the highest-performing approaches use token-based transformer models, which are not the most…

In this review, automatic defect inspection algorithms that analyze Scanning Electron Microscopy (SEM) images for Semiconductor Manufacturing (SM) are identified, categorized, and discussed. This is a topic of critical importance for the SM…

Debugging formal verification (FV) failures represents one of the most time-consuming bottlenecks in modern hardware design workflows. When properties fail, engineers must manually trace through complex counter-examples spanning multiple…

Finite Element Analysis (FEA) serves as the cornerstone of modern engineering design. However, its workflow is inherently complex and relies heavily on domain expertise. Although recent efforts have integrated Large Language Models (LLMs)…