相关论文: Fast inverse lithography based on a model-driven b…
VLSI mask optimization is one of the most critical stages in manufacturability aware design, which is costly due to the complicated mask optimization and lithography simulation. Recent researches have shown prominent advantages of machine…
Inverse Lithography Technology (ILT) has emerged as a promising solution for photo mask design and optimization. Relying on multi-beam mask writers, ILT enables the creation of free-form curvilinear mask shapes that enhance printed wafer…
Lithography simulation is a critical step in VLSI design and optimization for manufacturability. Existing solutions for highly accurate lithography simulation with rigorous models are computationally expensive and slow, even when equipped…
Model Predictive Control (MPC) is a powerful strategy for constrained multivariable systems but faces computational challenges in real-time deployment due to its online optimization requirements. While explicit MPC and neural network…
In this paper, we propose a novel gradient-based method to optimize curvilinear masks in optical lithography. The mask pattern is represented by periodic B-spline curves. We apply Delaunay triangulation to discretize the domains circled by…
Optical phase conjugation (OPC) is a nonlinear technique used for counteracting wavefront distortions, with various applications ranging from imaging to beam focusing. Here, we present the design of a diffractive wavefront processor to…
The rapid evolution of the electronics industry, driven by Moore's law and the proliferation of integrated circuits, has led to significant advancements in modern society, including the Internet, wireless communication, and artificial…
Achieving quantum-limited motional control of optically trapped particles beyond the sub-micrometer scale is an outstanding problem in levitated optomechanics. A key obstacle is solving the light scattering problem and identifying particle…
Image reconstruction under multiple light scattering is crucial in a number of applications such as diffraction tomography. The reconstruction problem is often formulated as a nonconvex optimization, where a nonlinear measurement model is…
Fast production of large area patterns with nanometre resolution is crucial for the established semiconductor industry and for enabling industrial-scale production of next-generation quantum devices. Metastable atom lithography with binary…
Observing certain patches in an image reduces the uncertainty of others. Their realization lowers the distribution entropy of each remaining patch feature, analogous to collapsing a particle's wave function in quantum mechanics. This…
Advancements in chip design and manufacturing have enabled the processing of complex tasks such as deep learning and natural language processing, paving the way for the development of artificial general intelligence (AGI). AI, on the other…
Optical approaches have made great strides towards the goal of high-speed, energy-efficient computing necessary for modern deep learning and AI applications. Read-in and read-out of data, however, limit the overall performance of existing…
Electron beam lithography (EBL) is a promising maskless solution for the technology beyond 14nm logic node. To overcome its throughput limitation, industry has proposed character projection (CP) technique, where some complex shapes…
Optical Character Recognition (OCR) is a fundamental task for digitizing information, serving as a critical bridge between visual data and textual understanding. While modern Vision-Language Models (VLM) have achieved high accuracy in this…
In the last few years, large improvements in image clustering have been driven by the recent advances in deep learning. However, due to the architectural complexity of deep neural networks, there is no mathematical theory that explains the…
Photolithography is a process in the production of integrated circuits in which a mask is used to create an exposed pattern with a desired geometric shape. In the inverse problem of photolithography, a desired pattern is given and the mask…
The primary challenge in accelerating image super-resolution lies in reducing computation while maintaining performance and adaptability. Motivated by the observation that high-frequency regions (e.g., edges and textures) are most critical…
Packing optimization is a prevalent problem that necessitates robust and efficient algorithms that are also simple to implement. One group of approaches is the raster methods, which rely on approximating the objects with pixelated…
Background subtraction is a fundamental low-level processing task in numerous computer vision applications. The vast majority of algorithms process images on a pixel-by-pixel basis, where an independent decision is made for each pixel. A…