相关论文: Grazing incidence interaction of Sn particles with…
The persistent interest of the epitaxy of group IV alloy GeSn is mainly driven by the demand of efficient light source that could be monolithically integrated on Si for mid-infrared Si photonics. For chemical vapor deposition of GeSn, the…
Recently, the production of ultrahigh-density (~10^{19}cm^{-3}) spin-polarized deuterium (SPD) atoms was demonstrated, from the photodissociation of deuterium iodide, but the upper density limit was not determined. Here, we present studies…
Recent developments in thin-film fabrication and processing open up interesting possibilities for both established and emerging optics technologies. There, one of the key questions requiring more complete understanding is by how much one…
EUV Lithography is the technology of choice for High-Volume Manufacturing (HVM) of sub-10nm lithography. One of the challenges is to enable in-situ cleaning of functional surfaces such as sensors, fiducials and interferometer mirrors…
Ion implantation is a powerful approach for tuning the electrical properties of materials through controlled doping and defect engineering, with applications in thermoelectrics and microelectronics. Scandium nitride (ScN) is particularly…
Germanium-tin (GeSn) photodiodes potentiate a viable solution to integrate SWIR and extended SWIR detection technology into CMOS processing line. However, challenges in the growth of thick, high quality GeSn limit the device absorber…
Overcoming the diffraction limit to achieve high optical resolution is one of the main challenges in the fields of plasmonics, nanooptics and nanophotonics. In this work, we introduce novel plasmonic structures consisting of nanoantennas…
I discuss the shape of the high energy end of the spectrum of particles arising from diffusive shock acceleration in the presence of (i) additional diffusive escape from the accelerator, (ii) continuous energy losses, (iii) energy changes…
Surface plasmon resonance (SPR) has been widely utilized to improve the absorption performance in the photosensors. Graphene has emerged as a promising plasmonic material, which supports tunable SPR and shows significant flexibility over…
Enhanced beam shifts mediated by surface plasmon resonance (SPR) at metal-dielectric interfaces have been widely investigated. However, research on the associated Imbert-Fedorov or spin Hall shifts, driven by the spin-orbit interaction of…
We investigate the enhanced electric dipole-dipole interaction by surface plasmon polaritons (SPPs) supported by the planar metal film waveguide. By taking two nitrogen-vacancy (NV) center electric-dipoles in diamond as an example, both the…
Interference patterns of surface plasmon polaritons(SPPs) are observed in the extraordinary optical transmission through subwavelength holes in optically thick metal plate. It is found that the phase of incident light can be transferred to…
The optical constants of ruthenium in the spectral range 8 nm to 23.75 nm with their corresponding uncertainties are derived from the reflectance of a sputtered ruthenium thin film in the Extreme Ultraviolet (EUV) spectral range measured…
We perform an initial study of DUNE's sensitivity to enhanced neutrino polarizability within models of light scalar mediators. We identify two possible signatures of polarizability due to neutrino scattering on electrons and due to coherent…
Tin-drop contamination was cleaned from multilayer-coated mirrors by induction of phase transformation. The {\beta} - {\alpha} phase transition of tin was induced to initiate material embrittlement and enable facile removal of thick tin…
Plasmonic gratings and nano-particle arrays in a metal-insulator-metal structures are fabricated on an erbium doped silicon nitride layer. This material system enables simple fabrication of the structure, since the active nitride layer can…
The High Resolution Imager (HRI_EUV) telescope of the Extreme Ultraviolet Imager (EUI) instrument onboard Solar Orbiter has observed EUV brightenings, so-called campfires, as fine-scale structures at coronal temperatures. The goal of this…
Practical extreme ultraviolet (EUV) sources yield the desired 13.5 nm radiation but also generate debris, significantly limiting the lifespan of the collector mirror in lithography. In this study, we explore the role of buffer gas in…
One of the key requirements for neutron scattering instruments is the Signal-to-Background ratio (SBR). This is as well a design driving requirement for many instruments at the European Spallation Source (ESS), which aspires to be the…
Microscopy with extreme ultraviolet (EUV) radiation holds promise for high-resolution imaging with excellent material contrast, due to the short wavelength and numerous element-specific absorption edges available in this spectral range. At…