利用 RMP 控制 ELM：等离子体响应模型及边缘剥离响应的作用
等离子体物理
2016-11-03 v1
摘要
共振磁扰动 (RMP) 已被广泛证明是一种缓解或抑制大型边缘局域模 (ELMs) 的可行技术。与此相关的是近年来大量的理论和建模工作。文献中已提出了各种描述等离子体对 RMP 场响应的模型，本文对此进行了简要回顾。尽管线性响应模型很简单，但它们可以提供不同于基于真空场标准的替代标准，用于指导线圈配置的选择以实现最佳的 ELM 控制。本文阐述了边缘剥离响应对 RMP 场的作用，将其作为低碰撞率等离子体中各种托卡马克装置中 ELM 缓解的关键指标。
引用
@article{arxiv.1607.01161,
title = {ELM control with RMP: plasma response models and the role of edge peeling response},
author = {Yueqiang Liu and C. J. Ham and A. Kirk and Li Li and A. Loarte and D. A. Ryan and Youwen Sun and W. Suttrop and Xu Yang and Lina Zhou},
journal= {arXiv preprint arXiv:1607.01161},
year = {2016}
}
备注
32 pages, 10 figures. This is an author-created, un-copyedited version of an article submitted for publication in Plasma Physics and Controlled Fusion. IoP Publishing Ltd is not responsible for any errors or omissions in this version of the manuscript or any version derived from it