Related papers: Extreme Ultraviolet (EUV) Sources for Lithography …
The driving engine of the Free Electron Laser in Hamburg (FLASH) is an L-band superconducting accelerator. It is designed to operate in burst mode with 800 microsecond pulse duration at a repetition rate of 10 Hz. The maximum accelerated…
The extreme ultraviolet (XUV) emission from dense plasmas generated with sub-10-fs laser pulses with varying peak intensities up to 3*10^16 W/cm^2 is investigated for different target materials. K shell spectra are obtained from low Z…
Ultraluminous X-ray sources (ULXs) are amongst the most intriguing of X-ray source classes. Their extreme luminosities - greater than 10^39 erg/s in the 0.3 - 10 keV band alone - suggest either the presence of black holes larger than those…
Mask-based pattern generation is a crucial step in microchip production. The next-generation extreme-ultraviolet- (EUV) lithography instruments with a wavelength of \SI{13.5}{\nano\meter} is currently under development. In principle, this…
Ultrafast transmission electron microscopy (UTEM) has emerged as a versatile technique for the time-resolved imaging of nanoscale dynamics on timescales down to few-hundred attoseconds but the temporal and spatial resolutions are still…
Experimental spectroscopic studies are presented, in a 5.5--25.5nm extreme-ultraviolet (EUV) wavelength range, of the light emitted from plasma produced by the irradiation of tin microdroplets by 5-ns-pulsed, 2-$\mu$m-wavelength laser…
Betatron radiation from laser wakefield accelerators is an ultrashort pulsed source of hard, synchrotron-like x-ray radiation. It emanates from a centimetre scale plasma accelerator producing GeV level electron beams. In recent years…
The generation of X-rays and {\gamma}-rays based on synchrotron radiation from free electrons, emitted in magnet arrays such as undulators, forms the basis of much of modern X-ray science. This approach has the drawback of requiring very…
Table-top extreme ultraviolet (EUV) microscopy offers unique opportunities for label-free investigation of biological samples. Here, we demonstrate ptychographic EUV imaging of two dried, unstained model specimens: germlings of a fungus…
Dynamic scattering and imaging with coherent, ultrafast, extreme ultraviolet (EUV) light sources can resolve charge, phonon and spin processes on their intrinsic length and time scales. However, full field coherent diffraction imaging…
Extreme ultraviolet (XUV) light sources allow for the probing of bound electron dynamics on attosecond scales, interrogation of high-energy-density matter, and access to novel regimes of strong-field quantum electrodynamics. Despite the…
Attosecond pulses of coherent extreme ultraviolet (XUV) light are instrumental for investigating subatomic dynamics and can be produced using a free-electron laser (FEL). It has been suggested that an optical FEL, which employs a laser…
Ultrafast laser sources in the far ultraviolet (100 nm to 300 nm) have been the subject of intense experimental efforts for several decades, driven primarily by the requirements of advanced experiments in ultrafast science. Resonant…
The new generation of lithography tools use high energy EUV radiation which ionizes the present background gas due to photoionization. To predict and understand the long term impact on the highly delicate mirrors It is essential to…
Transformation of a table-top electron beam sustained 2.45 GHz RF discharge in rare gases into a self burning discharge has been observed for increasing RF-amplitude. Thereby, the emission spectrum undergoes significant changes in a wide…
We performed an observational program with the X-ray satellite BeppoSAX to study objects with extreme synchrotron peak frequencies (nu_peak > 1 keV). Of the seven sources observed, four showed peak frequencies in the range 1-5 keV, while…
Vacuum ultraviolet (VUV) light at 118 nm has been shown to be a powerful tool to ionize molecules for various gas-phase chemical studies. A convenient table top source of 118 nm light can be produced by frequency tripling 355 nm light from…
We adapted a conventional microscope for projection photolithography using an ultraviolet (UV) light-emitting diode (LED) as a light source. The use of a UV LED provides the microscope projector with several advantages in terms of…
An experimental setup that directly reproduces Extreme UV-lithography relevant conditions for detailed component exposure tests is described. The EUV setup includes a pulsed plasma radiation source, operating at 13.5 nm; a debris mitigation…
Various scientific and industrial researches such as spectroscopy and advanced nano-technologies have been demanding high flux and fully coherent EUV and X-ray radiation. These demands can be commendably satisfied with a MHz-level…