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Related papers: Scale-dependent optimized homoepitaxy of InAs(111)…

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A comprehensive bulk and surface investigation of high-quality In$_2$O$_3$(001) single crystals is reported. The transparent-yellow, cube-shaped single crystals were grown using the flux method. Inductively coupled plasma mass spectrometry…

Self assembled AlN nanowires (NWs) are grown by plasma assisted molecular beam epitaxy (PAMBE) on SiO2 / Si (111) substrates. Using a combination of in-situ reflective high energy electron diffraction and ex situ X ray diffraction (XRD), we…

Materials Science · Physics 2024-02-02 Ž. Gačević , J. Grandal , Q. Guo , R. Kirste , M. Varela , Z. Sitar , M. A. Sánchez García

We have synthesized Fe$_{1+y}$Te thin films by means of molecular beam epitaxy (MBE) under Te-limited growth conditions. We found that epitaxial layer-by-layer growth is possible for a wide range of excess Fe values, wider than expected…

Transition metal oxide heterostructures and interfaces host a variety of exciting quantum phases and can be grown with atomic-scale precision by utilising the intensity oscillations of $in$ $situ$ reflection high-energy electron diffraction…

Materials Science · Physics 2017-08-02 T. W. Zhang , Z. W. Mao , Z. B. Gu , Y. F. Nie , X. Q. Pan

As a two-dimensional material, graphene can be naturally obtained via epitaxial growth on a suitable substrate. Growth condition optimization usually requires an atomistic level understanding of the growth mechanism. In this article, we…

Materials Science · Physics 2012-04-06 Ping Wu , Huijun Jiang , Wenhua Zhang , Zhenyu Li , Zhonghuai Hou , Jinlong Yang

Indium selenide attracts the interest due to its outstanding electronic and optical properties which are potentially prospective in view of applications in electronic and photonic devices. Most of the polymorphic crystal phases of this…

The challenge of parasitic bulk doping in Bi-based 3D topological insulator materials is still omnipresent, especially when preparing samples by molecular beam epitaxy (MBE). Here, we present a heterostructure approach for epitaxial BSTS…

Materials Science · Physics 2021-01-27 T. Mayer , H. Werner , F. Schmid , R. Diaz-Pardo , J. Fujii , I. Vobornik , C. H. Back , M. Kronseder , D. Bougeard

A three-step process was developed for growing high-quality, optically uniform WSe2 monolayers by molecular beam epitaxy (MBE) with advantage of using hexagonal boron nitride (hBN). The process was optimized to maximize the efficiency of…

Using scanning tunneling microscopy (STM), we investigate oxide-induced growth pits in Si thin films deposited by molecular beam epitaxy. In the transition temperature range from 2D adatom islanding to step-flow growth, systematic…

We studied and optimized the molecular beam epitaxy of GaSb layers on vicinal (001) Si substrates using a GaAs nucleation layer. An in-depth analysis of the different growth stages under optimized conditions revealed the formation of a high…

Materials Science · Physics 2019-10-25 M. Rio Calvo , J-B Rodriguez , L. Cerutti , M. Ramonda , G. Patriarche , E. Tournié

The initial steps of MBE growth of GaAs on beta 2-reconstructed GaAs(001) are investigated by performing total energy and electronic structure calculations using density functional theory and a repeated slab model of the surface. We study…

Condensed Matter · Physics 2009-10-31 P. Kratzer , C. G. Morgan , M. Scheffler

We report the interplay between In incorporation and strain relaxation kinetics in high-In-content InxGa1-xN (x = 0.3) layers grown by plasma-assisted molecular-beam epitaxy. For In mole fractions x = 0.13-0.48, best structural and…

The direct growth of III-V semiconductors on silicon holds tremendous potential for photonics applications. However, the inherent differences in their properties lead to defects in the epitaxial layer, including threading dislocations…

Materials Science · Physics 2024-02-23 Kun Cheng , Tianyi Tang , Wenkang Zhan , Zhenyu Sun , Bo Xu , Chao Zhao , Zhanguo Wang

The surface orientation can have profound effects on the atomic-scale processes of crystal growth, and is essential to such technologies as GaN-based light-emitting diodes and high-power electronics. We investigate the dependence of…

Materials Science · Physics 2017-04-26 Dongwei Xu , Peter Zapol , G. Brian Stephenson , Carol Thompson

2H-TaS$_2$ few layers have been grown epitaxially onto GaN(0001). A high substrate growth temperature of 825$^{\circ}$C induces best structural properties of the overlayer, as revealed by in-situ electron diffraction (RHEED and LEED). The…

Materials Science · Physics 2025-10-23 Constantin Hilbrunner , Tobias Meyer , Joerg Malindretos , Angela Rizzi

The emergence of two-dimensional (2D) materials launched a fascinating frontier of flatland electronics. Most crystalline atomic layer materials are based on layered van der Waals materials with weak interlayer bonding, which naturally…

Mesoscale and Nanoscale Physics · Physics 2022-08-10 Hui Zhang , Madisen Holbrook , Fei Cheng , Hyoungdo Nam , Mengke Liu , Chi-Ruei Pan , Damien West , Shengbai Zhang , Mei-Yin Chou , Chih-Kang Shih

As an organic semiconductor and a prototypical acceptor molecule in organic photovoltaics, C$_{60}$ has broad relevance to the world of organic thin film electronics. Although highly uniform C$_{60}$ thin films are necessary to conduct…

We report the molecular beam epitaxy of Bi_1-xSb_x thin films ($0 \leq x \leq 1$) on (0001) sapphire substrates using a thin (Bi,Sb)$_2$Te$_3$ buffer layer. Characterization of the films using reflection high energy diffraction, x-ray…

MoTe2 is the least explored material in the Molybdenum-chalcogen family, which crystallizes in thermodynamically stable semiconducting 2H phase at \textless 500 C and 1T' metallic phase at higher temperatures. Molecular beam epitaxy (MBE)…

We report a method for growing rectangular InAs nanofins with deterministic length, width and height by dielectric-templated selective-area epitaxy. These freestanding nanofins can be transferred to lay flat on a separate substrate for…

Mesoscale and Nanoscale Physics · Physics 2019-07-02 J. Seidl , J. G. Gluschke , X. Yuan , S. Naureen , N. Shahid , H. H. Tan , C. Jagadish , A. P. Micolich , P. Caroff