Related papers: Miniature Plasma Source for In-Situ Scanner Cleani…
In the past years, EUV lithography scanner systems have entered High-Volume Manufacturing for state-of-the-art Integrated Circuits (IC), with critical dimensions down to 10 nm. This technology uses 13.5 nm EUV radiation, which is shaped and…
In the past years, EUV lithography scanner systems have entered High-Volume Manufacturing for state-of-the-art Integrated Circuits (IC), with critical dimensions down to 10 nm. This technology uses 13.5 nm EUV radiation, which is…
An experimental setup that directly reproduces Extreme UV-lithography relevant conditions for detailed component exposure tests is described. The EUV setup includes a pulsed plasma radiation source, operating at 13.5 nm; a debris mitigation…
A critical technology for high-volume manufacturing of nanoscale integrated circuits is a high-power extreme ultraviolet (EUV) light source. Over the past decades, laser-produced plasma (LPP) sources have been actively utilized in this…
We discuss a concept of a point-like source of the extreme ultraviolet (EUV) light based on a non-equilibrium microwave discharge in expanding jet of dense xenon plasma with multiply charged ions. A conversion efficiency of microwave…
Hydrogen electron cyclotron resonance ion sources plasma measurements based on simple optical emission spectroscopy on a new compact low current ion source designed and built by the authors is presented. By observing the plasma luminescence…
Next generation EUV sources for photolithography use light produced by laser-produced plasmas (LPP) from ablated tin droplets. A major challenge for extending the lifetime of these devices is mitigating damage caused by deposition of tin…
We present a comprehensive characterization of laser-produced tin (Sn) plasmas relevant to extreme ultraviolet (EUV) lithography using a multi-diagnostic suite integrated into the new experimental platform, "SparkLight". Tin plasmas are…
Negative hydrogen ion sources are used as injectors into accelerators and drive the neutral beam heating in ITER. Certain processes in low-temperature hydrogen plasmas are accompanied by the emission of vacuum ultraviolet (VUV) emission.…
A plasma glow discharge system was created using a conventional microwave oven to ignite and maintain the plasma. The system was used for plasma cleaning and its properties were analysed to assess its viability for removing surface…
Microwave plasma discharges working at low pressure are nowadays a well-developed technique mainly used to provide radiations at different wavelengths. The aim of this work is to show that those discharges are an efficient windowless VUV…
Microplasmas can be used for a wide range of technological applications and to improve our understanding of fundamental physics. Scanning electron microscopy, on the other hand, provides insights into the sample morphology and chemistry of…
The next generation of lithography machines uses extreme ultraviolet (EUV) light originating from laser-produced plasma (LPP) sources, where a small tin droplet is ionized by an intense laser pulse to emit the requested light at 13.5 nm.…
Mask-based pattern generation is a crucial step in microchip production. The next-generation extreme-ultraviolet- (EUV) lithography instruments with a wavelength of \SI{13.5}{\nano\meter} is currently under development. In principle, this…
Extreme ultraviolet (EUV) lithography is the leading lithography technique in CMOS mass production, moving towards the sub-10 nm half-pitch (HP) regime with the ongoing development of the next generation high-numerical aperture (high-NA)…
The study presented here was initiated by a discussion to investigate the possibility of using synchrotron radiation as a source for the Next Generation Lithography (NGL) based on the EUV-concept (Extreme Ultra-Violet; here 13.5 nm or 11.3…
In this paper we introduce a new diagnostic technique that uses prominence EUV and UV absorption to determine the prominence plasma electron temperature and column emission measure, as well as He/H relative abundance; if a realistic…
Cleaning of contamination of optical surfaces by amorphous carbon (a-C) is highly relevant for extreme ultraviolet (EUV) lithography. We have studied the mechanisms for a-C removal from a Si surface. By comparing a-C removal in a surface…
Novel methods for diagnostics of molecular hydrogen plasma processes, such as ionization, production of high vibrational levels, dissociation of molecules via excitation to singlet and triplet states and production of metastable states, are…
A plasma focus device capable of operating at 0.2 pulses per second during several minutes is used as a source of hard x-rays and fast neutrons. An experimental demonstration of the use of the neutrons emissions for radiation probing of…