Related papers: Miniature Plasma Source for In-Situ Scanner Cleani…
The structure of the solid-liquid interface often defines function and performance of materials in applications. To study the interface at the atomic scale, we extended an ultrahigh vacuum (UHV) surface-science chamber with an apparatus…
Microscopic analysis of micro particles in situ in diverse water environments is necessary for monitoring water quality and localizing contamination sources. Conventional sensors such as optical microscopes and fluorometers often require…
Deep ultraviolet (DUV) laser pulses with tuneable wavelength and very short duration are a key enabling technology for next-generation technology and ultrafast science. Their generation has been the subject of extensive experimental effort,…
The efficiency of a coherent VUV source at 125 nm, based on 2-photon resonant four-wave mixing in mercury vapor, has been enhanced by up to 2 orders of magnitude. This enhancement was obtained by locally heating a liquid Hg surface with a…
Recent progress in laser-driven plasma acceleration now enables the acceleration of electrons to several gigaelectronvolts. Taking advantage of these novel accelerators, ultra-short, compact and spatially coherent X-ray sources called…
This thesis is about the designing and constructing a microwave ion source. The ions are generated in a thermal and dense hydrogen plasma by microwave induction. The plasma is generated by using a microwave source with a frequency of 2.45…
Spectral measurements play a vital role in understanding laser-plasma interactions. The ability to accurately measure the spectrum of radiation sources is crucial for unraveling the underlying physics. In this article, we introduce a novel…
We used numerical modeling to study the evolution of EUV-induced plasmas in argon and hydrogen. The results of simulations were compared to the electron densities measured by microwave cavity resonance spectroscopy. It was found that the…
In this work, we show the feasibility of extreme ultraviolet (EUV) patterning on an HF-treated Si(100) surface in the absence of a photoresist. EUV lithography is the leading lithography technique in semiconductor manufacturing due to its…
The recent advancement of high-intensity lasers has made all-optical Compton scattering become a promising way to produce ultra-short brilliant $\gamma$-rays in an ultra-compact system. However, so far achieved Compton $\gamma$-ray sources…
One of the daunting challenges in modern low temperature scanning tunneling microscopy (STM) is the difficulty of combining atomic resolution with cryogen free cooling. Further functionality needs, such as ultra-high vacuum (UHV), high…
To assess the feasibility of in-situ plasma cleaning for copper cavities, a 13.56 MHz inductively coupled plasma platform with a built-in coil was developed at Tsinghua University. Experiments were conducted using this platform to optimize…
A new experimental technique for investigating characteristics of plasma generated with plasmotrons in electrophysical installations was proposed. The technique involves a simultaneous registration of both radiation spectra and images of…
High intensity laser-plasma interactions produce a wide array of energetic particles and beams with promising applications. Unfortunately, high repetition rate and high average power requirements for many applications are not satisfied by…
We propose a new concept of an electron source for ultrafast electron diffraction with sub-10~fs temporal resolution. Electrons are generated in a laser-plasma accelerator, able to deliver femtosecond electron bunches at 5 MeV energy with…
A simple table-size ECR plasma generator operates in the ATOMKI without axial magnetic trap and without any particle extraction tool. Radial plasma confinement is ensured by a NdFeB hexapole. The table-top ECR is a simplified version of the…
A compact damping ring with limited circumference of about 160 m is proposed for producing kilowatt-level coherent EUV radiation. The electron bunch in the ring is modulated by a 257nm wavelength laser with the help of the angular…
Extreme ultraviolet (EUV) coherent sources below 120nm are of paramount significance for promoting next-generation nano-scale lithography,precision spectroscopy, and exploring the emerging physical phenomena in quantum materials. Nonlinear…
Extreme Ultraviolet (EUV) photolithography is seen as the key enabler for increasing transistor density in the next decade. In EUV lithography, 13.5 nm EUV light is illuminated through a reticle, holding a pattern to be printed, onto a…
This paper describes the construction and performance of a VUV-simulator that has been designed to study degradation of materials under space conditions. It is part of the Complex Irradiation Facility at DLR in Bremen, Germany, that has…