Related papers: Miniature Plasma Source for In-Situ Scanner Cleani…

This paper discusses a simple, low-cost, highly efficient two-mirror projector with a simplified illumination system. The EUV source power can be reduced by 1/10 compared to the current six-mirror EUV projector system. The required EUV…

The new generation of lithography tools use high energy EUV radiation which ionizes the present background gas due to photoionization. To predict and understand the long term impact on the highly delicate mirrors It is essential to…

Bright sources of high-energy X-rays and electrons are indispensable tools in advanced imaging. Yet, current laser-driven systems typically support only single-modality imaging, require complex infrastructure, or operate at low repetition…

A new approach for an in-line beam monitor for ionizing radiation was introduced in a recent publication (Beckers, J., et al. "Mapping electron dynamics in highly transient EUV photon-induced plasmas: a novel diagnostic approach using…

Extreme ultraviolet (EUV) lithography is the cornerstone of the fabrication of advanced integrated circuits at the 7-nm node and beyond, but its reliance on multi-element reflective projection optics makes it inaccessible for small-scale…

Microscopy with extreme ultraviolet (EUV) radiation holds promise for high-resolution imaging with excellent material contrast, due to the short wavelength and numerous element-specific absorption edges available in this spectral range. At…

We present the results of spectroscopic measurements in the extreme ultraviolet (EUV) regime (7-17 nm) of molten tin microdroplets illuminated by a high-intensity 3-J, 60-ns Nd:YAG laser pulse. The strong 13.5 nm emission from this…

IShTAR (Ion cyclotron Sheath Test ARrangement) is a dedicated test facility to investigate the interaction of ICRF wave and plasma at the Max-Planck Institute for Plasma Physics in Garching, Germany. Plasma is provided by a plasma source…

Improvement of tool reliability and uptime is a current focus in development of extreme ultraviolet lithography. The lifetime of collection mirrors for extreme ultraviolet light in tin-based plasma light sources is limited considerably by…

We have used a combination of numerical modeling and experiments to study carbon etching in the presence of a hydrogen plasma. We model the evolution of a low density EUV-induced plasma during and after the EUV pulse to obtain the energy…

Unraveling and controlling chemical dynamics requires techniques to image structural changes of molecules with femtosecond temporal and picometer spatial resolution. Ultrashort-pulse x-ray free-electron lasers have significantly advanced…

Ptychographic extreme ultraviolet (EUV) diffractive imaging has emerged as a promising candidate for the next-generation metrology solutions in the semiconductor industry, as it can image wafer samples in reflection geometry at the…

We report experimental results of vacuum ultraviolet (VUV) emission from the plasma of an electron cyclotron resonance (ECR) discharge in hydrogen, sustained by powerful millimeter-wavelength radiation of a gyrotron. Distinctive features of…

Plasma accelerators utilize strong electric fields in plasma waves to accelerate charged particles, making them a compact alternative to radiofrequency technologies. Discharge capillaries are plasma sources used in plasma accelerator…

The dynamics of H atom recombination on materials of interest for a EUV lithographer was studied under a longterm low-pressure H2 plasma exposure. The similarity of the experimental plasma with the typical EUV-induced plasma over the…

Each successive generation of x-ray machines has opened up new frontiers in science, such as the first radiographs and the determination of the structure of DNA. State-of-the-art x-ray sources can now produce coherent high brightness keV…

The absence of efficient light modulators for extreme ultraviolet (EUV) and X-ray photons significantly limits their real-life application, particularly when even slight complexity of the beam patterns is required. Here we report on a novel…

NIO1 is a compact and flexible radiofrequency H- ion source, developed by Consorzio RFX and INFN-LNL. Aim of the experimentation on NIO1 is the optimization of both the production of negative ions and their extraction and beam optics. In…

X-ray lasers based on transitions in highly charged \textit{Ni}-like ions generating in the "water window" wavelength range can be pumped by compact laboratory discharge sources. This makes them promising candidates for use as compact…

The development of compact and bright XUV and soft X-ray sources based on high-order harmonic generation is boosting advances towards understanding the behavior of matter with extreme temporal and spatial resolutions. Here, we report…