Related papers: Plasma-assisted Discharges and Charging in EUV-ind…
An experimental setup that directly reproduces Extreme UV-lithography relevant conditions for detailed component exposure tests is described. The EUV setup includes a pulsed plasma radiation source, operating at 13.5 nm; a debris mitigation…
In the past years, EUV lithography scanner systems have entered High-Volume Manufacturing for state-of-the-art Integrated Circuits (IC), with critical dimensions down to 10 nm. This technology uses 13.5 nm EUV radiation, which is shaped and…
The nanoparticle charging processes along with background spatial-temporal plasma profile have been investigated with 3DPIC simulation in a pulsed EUV exposure environment. It is found that the particle charge polarity (positive or…
EUV Lithography is the technology of choice for High-Volume Manufacturing (HVM) of sub-10nm lithography. One of the challenges is to enable in-situ cleaning of functional surfaces such as sensors, fiducials and interferometer mirrors…
The new generation of lithography tools use high energy EUV radiation which ionizes the present background gas due to photoionization. To predict and understand the long term impact on the highly delicate mirrors It is essential to…
Extreme ultraviolet (EUV) lithography has revolutionized high-volume manufacturing of nanoscale components, enabling the production of smaller, denser, and more energy efficient integrated circuit devices. Yet, the use of EUV light results…
Extreme ultraviolet (EUV) induced pulsed plasma is unique due to its transient characteristics: the plasma switches between non-thermal state (when EUV power is ON at the beginning of the pulse) and thermal state (end of the pulse at ~ 20…
We used numerical modeling to study the evolution of EUV-induced plasmas in argon and hydrogen. The results of simulations were compared to the electron densities measured by microwave cavity resonance spectroscopy. It was found that the…
A plethora of studies ranging from precision physics to quantum information employ ions, highly excited neutral atoms or polar molecules as tools. Motivated by the need for miniaturization, scalability and controllability, the particles are…
We measured for the first time the electron density in an Extreme Ultra-Violet induced plasma. This is achieved in a low-pressure argon plasma by using a method called microwave cavity resonance spectroscopy. The measured electron density…
Atmospheric-pressure microdischarges excited by nanosecond high-voltage pulses are investigated in helium-nitrogen mixtures by first-principles particle-based simulations that include VUV resonance radiation transport via tracing photon…
Plasma accelerators utilize strong electric fields in plasma waves to accelerate charged particles, making them a compact alternative to radiofrequency technologies. Discharge capillaries are plasma sources used in plasma accelerator…
We have used a combination of numerical modeling and experiments to study carbon etching in the presence of a hydrogen plasma. We model the evolution of a low density EUV-induced plasma during and after the EUV pulse to obtain the energy…
A critical technology for high-volume manufacturing of nanoscale integrated circuits is a high-power extreme ultraviolet (EUV) light source. Over the past decades, laser-produced plasma (LPP) sources have been actively utilized in this…
A new approach for an in-line beam monitor for ionizing radiation was introduced in a recent publication (Beckers, J., et al. "Mapping electron dynamics in highly transient EUV photon-induced plasmas: a novel diagnostic approach using…
Absolute values of VUV-emission of a 2.45 GHz microwave-driven hydrogen discharge are reported. The measurements were performed with a robust and straightforward method based on a photodiode and optical filters. It was found that the…
The highly resolved temporal evolution of laser-induced micro-explosions on a germanium surface is studied in a triode configuration for various gate charge levels and cathode currents. Electron emission from individual spots is directly…
We investigate the laser-induced quantum interference in EUV superfluorescence occurring in a dense gas of $\Lambda$-type helium atoms coupled by a coherent laser field in the visible region. Due to the constructive interatomic and…
We report the first direct demonstration of possibility to generate the extreme ultraviolet (EUV) radiation with a freely expanding jet of dense plasma with multiply-charged ions supported by high-power microwaves. The detected emission…
A low-pressure double-inductively coupled plasma device is used to study the fundamental plasma parameters, plasma chemistry, and UV photon emission from the first excited state of nitric oxide, NO(A), in gas mixtures of nitrogen and…