Related papers: Plasma-assisted Discharges and Charging in EUV-ind…
In this work, we show the feasibility of extreme ultraviolet (EUV) patterning on an HF-treated Si(100) surface in the absence of a photoresist. EUV lithography is the leading lithography technique in semiconductor manufacturing due to its…
Laser-driven plasma wakefields can provide hundreds of MeV electron beam in mm-range distances potentially shrinking the dimension of the actual particle accelerators. The plasma density plays a fundamental role in the control and stability…
Surface charging is a phenomenon ubiquitously observable in in-situ transmission electron microscopy of non-conducting specimens as a result of electron beam/sample interactions or optical stimuli and often limits the achievable image…
An extreme ultraviolet (EUV) single attosecond pulse passing through a laser-dressed dense gas is studied theoretically. The weak EUV pulse pumps the helium gas from the ground state to the 2s2p(1P) autoionizing state, which is coupled to…
We demonstrate an electric field-resolved approach for probing ultrafast dynamics of photoinjected charges in solids. Direct access to the electric field of few-cycle pulses enables us to measure a broadband response of a medium with…
A Computationally Assisted Spectroscopic Technique to measure secondary electron emission coefficients ($\gamma$-CAST) in capacitively-coupled radio-frequency plasmas is proposed. This non-intrusive, sensitive diagnostic is based on a…
Microwave plasma discharges working at low pressure are nowadays a well-developed technique mainly used to provide radiations at different wavelengths. The aim of this work is to show that those discharges are an efficient windowless VUV…
The EuPRAXIA project aims to construct two state-of-the-art accelerator facilities based on plasma accelerator technology. Plasma-based accelerators offer the possibility of a significant reduction in facility size and cost savings over…
Experiments to study the light emission from plasma produced by particle beams are presented. Fundamental aspects in comparison with discharge plasma formation are discussed. It is shown that the formation of excimer molecules is an…
We present a novel time- and phase-resolved, background-free scheme to study the extreme ultraviolet dipole emission of a bound electronic wavepacket, without the use of any extreme ultraviolet exciting pulse. Using multiphoton transitions,…
The effects of the discharge voltage on the formation and nature of electric field transients in a symmetric, collisionless, very high frequency, capacitively coupled plasma are studied using a self-consistent particle-in-cell (PIC)…
Cleaning of contamination of optical surfaces by amorphous carbon (a-C) is highly relevant for extreme ultraviolet (EUV) lithography. We have studied the mechanisms for a-C removal from a Si surface. By comparing a-C removal in a surface…
The emission properties of tin plasmas, produced by the irradiation of preformed liquid tin targets by several-ns-long 2-$\mu$m-wavelength laser pulses, are studied in the extreme ultraviolet (EUV) regime. In a two-pulse scheme, a pre-pulse…
Plasma effect is observed in CCDs exposed to heavy ionizing alpha-particles with energies in the range 0.5 - 5.5 MeV. The results obtained for the size of the charge clusters reconstructed on the CCD pixels agrees with previous measurements…
Non-self-sustained electric discharge and electric breakdown were triggered and guided by a train of picosecond UV pulses overlapped with a long free-running UV pulse of a hybrid Ti:Sapphire-KrF laser facility. Photocurrent sustained by…
Following requirements of the plasma processing industry for increasing throughput, capacitively coupled plasma reactors with large area electrodes driving by very high frequency sources have been proposed. However, such reactors with…
At EuPRAXIA@SPARC_LAB, the unique combination of an advanced high-brightness RF injector and a plasma-based accelerator will drive a new multi-disciplinary user-facility. The facility, that is currently under study at INFN-LNF Laboratories…
We demonstrate laser-plasma acceleration of high charge electron beams to the ~10 MeV scale using ultrashort laser pulses with as little energy as 10 mJ. This result is made possible by an extremely dense and thin hydrogen gas jet. Total…
Microscopy with extreme ultraviolet (EUV) radiation holds promise for high-resolution imaging with excellent material contrast, due to the short wavelength and numerous element-specific absorption edges available in this spectral range. At…
Plasma waves generated in the wake of intense, relativistic laser or particle beams can accelerate electron bunches to giga-electronvolt (GeV) energies in centimetre-scale distances. This allows the realization of compact accelerators…