Related papers: Nanometer resolution mask lithography with matter …
With continued feature size scaling, even state of the art semiconductor manufacturing processes will often run into layouts with poor printability and yield. Identifying lithography hotspots is important at both physical verification and…
Fabricating patterned nanostructures with matter waves can help to realise new nanophotonic devices. However, due to dispersion effects, designing patterns with nanoscale features is challenging. Here, we consider the propagation of a…
We report a novel method for depositing patterned dielectric layers with sub-micron features using atomic layer deposition (ALD). The patterned films are superior to sputtered or evaporated films in continuity, smoothness, conformality, and…
New techniques for imaging electromagnetic near-fields in nanostructures drive advancements in nanotechnology, optoelectronics, materials science, and biochemistry. Most existing techniques probe near-fields along surfaces, lacking the…
A refined model of an extreme ultraviolet (EUV) mask stack consisting of the Mo/Si multilayer coated by a Ru protective layer and a TaBN/TaBO absorber layer was developed to facilitate accurate simulations of EUV mask performance for…
Higher resolution demands for semiconductor lithography may be fulfilled by higher numerical aperture (NA) systems. However, NAs more than the photoresist refractive index (~1.7) cause surface confinement of the image. In this letter we…
Plasmonic nanolithography is a nanofabrication technique which exploits surface plasmons to generate subdiffraction patterns. In this review, we highlight the key concepts in plasmonic nanolithography, review the pioneering papers and…
All-dielectric optical nano-resonators, exhibiting exotic near-field distributions upon excitations, have emerged as low-loss, versatile and highly adaptable components in nanophotonic structures for manipulating electromagnetic waves and…
The rational design of photonic nanostructures consists in anticipating their optical response from simple models or as variations of reference systems. This strategy is limited when different objectives are simultaneously targeted.…
Advances in the development of free-electron lasers offer the realistic prospect of high-resolution imaging to study the nanoworld on the time-scale of atomic motions. We identify X-ray Fourier Transform holography, (FTH) as a promising…
Measuring the three-dimensional (3D) distribution of chemistry in nanoscale matter is a longstanding challenge for metrological science. The inelastic scattering events required for 3D chemical imaging are too rare, requiring high beam…
Tomographic Volumetric Additive Manufacturing (TVAM) allows printing of mesoscopic objects within seconds or minutes. Tomographic patterns are illuminated onto a rotating glass vial which contains a photosensitive resin. Current pattern…
We propose a novel approach to site-resolved detection of a 2D gas of ultracold atoms in an optical lattice. A near resonant laser beam is coherently scattered by the atomic array and its interference pattern is holographically recorded by…
Inverse Lithography Technology (ILT) has emerged as a promising solution for photo mask design and optimization. Relying on multi-beam mask writers, ILT enables the creation of free-form curvilinear mask shapes that enhance printed wafer…
The most direct definition of a patterning process' resolution is the smallest half-pitch feature it is capable of transferring onto the substrate. Here we demonstrate that thermal Scanning Probe Lithography (t-SPL) is capable of…
The recently proposed bianisotropic acoustic metagratings offer promising opportunities for passive acoustic wavefront manipulation, which is of particular interest in flat acoustic lenses and ultrasound imaging at ultra-high frequency…
Achieving atomic precision in top-down manufacturing remains a fundamental challenge nanofabrication technology. Here, the focused electron beam of a scanning transmission electron microscope is used to demonstrate atomically precise…
Nanofabrication techniques for superconducting qubits rely on resist-based masks patterned by electron-beam or optical lithography. We have developed an alternative nanofabrication technique based on free-standing silicon shadow masks…
The fabrication of functional metamaterials with extreme feature resolution finds a host of applications such as the broad area of surface/light interaction. Non-planar features of such structures can significantly enhance their performance…
Electron backscatter diffraction (EBSD) is a well-established method of characterisation for crystalline materials. This technique can rapidly acquire and index diffraction patterns to provide phase and orientation information about the…