Related papers: Nanometer resolution mask lithography with matter …
Beam shaping - the ability to engineer the phase and the amplitude of massive and massless particles - has long interested scientists working on communication, imaging and the foundations of quantum mechanics. In light optics, the shaping…
Using the illuminator for high numerical aperture (NA) extreme ultraviolet (EUV) exposure tool in EUV lithography can lead to support volume production of sub-2 nm logic nodes and leading-edge DRAM nodes. However, the typical design method…
Two-dimensional heterostructures with layers of slightly different lattice vectors exhibit a new periodic structure known as moire lattices. Moire lattice formation provides a powerful new way to engineer the electronic structure of…
Sub-micrometer scale light patterns play a pivotal role in various fields, including biology, biophysics, and AMO physics. High-resolution, in situ observation of light profiles is essential for their design and application. However,…
Nanostructuring allows altering of the electronic and photonic properties of two-dimensional (2D) materials. The efficiency, flexibility, and convenience of top-down lithography processes are however compromised by nm-scale edge roughness…
Three-dimensional segmentation in magnetic resonance images (MRI), which reflects the true shape of the objects, is challenging since high-resolution isotropic MRIs are rare and typical MRIs are anisotropic, with the out-of-plane dimension…
We adapted a conventional microscope for projection photolithography using an ultraviolet (UV) light-emitting diode (LED) as a light source. The use of a UV LED provides the microscope projector with several advantages in terms of…
We report nanoscale patterning of graphene using a helium ion microscope configured for lithography. Helium ion lithography is a direct-write lithography process, comparable to conventional focused ion beam patterning, with no resist or…
Plane-parallel resonator configuration is proposed for high-NA EUV lithography, where the lithography mask and the wafer are parallelly arranged through two focusing mirrors. EUV light is injected through an off-axis rotating mirror at the…
Transmission electron microscopes use electrons with wavelengths of a few picometers, potentially capable of imaging individual atoms in solids at a resolution ultimately set by the intrinsic size of an atom. Unfortunately, due to…
Nanoimprint lithography (NIL) is an attractive nonconventional lithographic technique in the fabrication of superconducting nanowires for superconducting nanowire single-photon detectors (SNSPDs) with large effective detection areas or…
We consider the inverse problem of in-line holography, applied to minimally-destructive imaging of cold atom clouds. Absorption imaging near-resonance provides a simple, but destructive measurement of atom column density. Imaging off…
In this paper we demonstrate atomic-scale lithography on hydrogen terminated Ge(001. The lithographic patterns were obtained by selectively desorbing hydrogen atoms from a H resist layer adsorbed on a clean, atomically flat Ge(001) surface…
We propose metasurface holograms as a novel platform to generate optical trap arrays for cold atoms with high fidelity, efficiency, and thermal stability. We developed design and fabrication methodologies to create dielectric, phase-only…
We perform 3D lithography simulations by using a finite-element solver. To proof applicability to real 3D problems we investigate DUV light propagation through a structure of size 9 microns times 4 microns times 65 nm. On this relatively…
Nowadays, microelectronics and nanoelectronics require the search for new materials, including masks for creating structures. Today, the intermediate hard mask strategy is one of the key issues in achieving a good balance between…
Nanoimprint lithography (NIL) is a widely used high-throughput fabrication technique for photonic devices, yet its reliability is often compromised by the inevitable imperfections that arise during the demolding process. Topological…
The ability to create superlattices in van der Waals (vdW) heterostructures via moir\'e interference heralded a new era in the science and technology of two-dimensional materials. Through precise control of the twist angle, flat bands and…
Although several optical techniques have been recently developed in order to overcome the resolution limit in microscopy, the imaging of sub-wavelength features is still a real challenge. In practise, super-resolution techniques remain…
3D printing has revolutionized the manufacturing of volumetric components and structures in many areas. Different technologies have been developed including light-induced techniques based on the photopolymerization of liquid resins. In…