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This paper discusses a simple, low-cost, highly efficient two-mirror projector with a simplified illumination system. The EUV source power can be reduced by 1/10 compared to the current six-mirror EUV projector system. The required EUV…
The fabrication of multilayered heterostructures is essential for advancing microelectronic and biosensing technologies. Conventional top-down manufacturing techniques are often cost-prohibitive and unsuitable for biomedical applications.…
We propose an approach for super-resolution optical lithography which is based on the inverse of magnetic resonance imaging (MRI). The technique uses atomic coherence in an ensemble of spin systems whose final state population can be…
Dielectric metasurfaces that combine high-index materials with optical nonlinearities are widely recognized for their potential in various quantum and classical nanophotonic applications. However, the fabrication of high-quality…
Ptychographic extreme ultraviolet (EUV) diffractive imaging has emerged as a promising candidate for the next-generation metrology solutions in the semiconductor industry, as it can image wafer samples in reflection geometry at the…
Nonlinear metasurface holography shows the great potential of metasurfaces to control the phase, amplitude, and polarization of light while simultaneously converting the frequency of the light. The possibility of tailoring the scattering…
Holography relies on the interference between a known reference and a signal of interest to reconstruct both the amplitude and phase of that signal. Commonly performed with photons and electrons, it finds numerous applications in imaging,…
We present results of a fabrication-process development for the lithographic pattern transfer into the sub-100nm range by combining electron-beam lithography and reactive dry etching to obtain high quality niobium-based light-sensitive…
Laser Interference Lithography (LIL) is a versatile fabrication method for patterning sub-micron structures in arrays covering large areas. It is a facile and fast mask-less lithography process to produce large area periodic patterns. The…
Optical metasurfaces, consisting of subwavelength-scale meta-atom arrays, hold great promise to overcome fundamental limitations of conventional optics. Scalable nanomanufacturing of metasurfaces with high uniformity and reproducibility is…
The diffraction of atoms and molecules through tiny, sub-nanometre holes in atomically thin membranes is a promising approach for advancing atom interferometry sensing and atomic holography. However, dispersion interactions, such as the…
In the past couple of decades, colloidal inorganic nanocrystals and, more specifically, semiconductor quantum dots have emerged as crucial materials for the development of nanoscience and nanotechnology, with applications in very diverse…
Multilayer metasurfaces provide substantially greater spectral design freedom than single-layer devices, yet their implementation in the visible and near-infrared remains limited by the complexity, cost, and low throughput of conventional…
This paper reports on an approach for fabrication of micro-channels with nanometer thickness achieved by optimization of UV lithography processes. Rectangular micro-channels with a staple edge are fabricated over the surface of a silicon…
We demonstrate a systematic approach to sub-wavelength resolution lithographic image formation on films covering areas larger than a wavelength squared. For example, it is possible to make a lithographic pattern with a feature size…
The capability of holography to project three-dimensional (3D) images and correct for aberrations offers much potential to enhance optical control in light-based 3D printing. Notably, multi-beam multi-wavelength holographic systems…
Off-axis X-ray holography is a lensless imaging technique that allows unambiguous retrieval of an object's exit-wave function with high fidelity. It has been used with great success to study nanoscale phenomena and spatio-temporal dynamics…
Lithography simulation is a critical step in VLSI design and optimization for manufacturability. Existing solutions for highly accurate lithography simulation with rigorous models are computationally expensive and slow, even when equipped…
Aluminum nitride (AlN) is an extremely promising material for integrated photonics because of the combination of strong \c{hi}2 and \c{hi}3 nonlinearities. However, the intrinsic hardness of the material and charging effects during electron…
One-photon or two photon absorption by dye molecules in photopolymers enable direct 2D & 3D lithography of micro/nano structures with high spatial resolution and can be used effectively in fabricating artificially structured nanomaterials.…