English

SiC Graphene Suitable For Quantum Hall Resistance Metrology

Mesoscale and Nanoscale Physics 2010-04-28 v1

Abstract

We report the first observation of the quantum Hall effect in epitaxial graphene. The result described in the submitted manuscript fills the yawning gap in the understanding of the electronic properties of this truly remarkable material and demonstrate suitability of the silicon carbide technology for manufactiring large area high quality graphene. Having found the quantum Hall effect in several devices produced on distant parts of a single large-area wafer, we can confirm that material synthesized on the Si-terminated face of SiC promises a suitable platform for the implementations of quantum resistance metrology at elevated temperatures and, in the longer term, opens bright prospects for scalable electronics based on graphene.

Keywords

Cite

@article{arxiv.0909.1193,
  title  = {SiC Graphene Suitable For Quantum Hall Resistance Metrology},
  author = {Samuel Lara-Avila and Alexei Kalaboukhov and Sara Paolillo and Mikael Syväjärvi and Rositza Yakimova and Vladimir Fal'ko and Alexander Tzalenchuk and Sergey Kubatkin},
  journal= {arXiv preprint arXiv:0909.1193},
  year   = {2010}
}

Comments

Submitted to Science Brevia 07 July 2009, rejected 10 July 2009 as more appropriate for a more specialized journal

R2 v1 2026-06-21T13:43:20.893Z