The charge doped into a semiconductor in a field effect transistor (FET) is generally confined to the interface of the semiconductor. A planar step at the interface causes a potential drop due to the strong electric field of the FET, which in turn is screened by the doped carriers. We analyze the dipolar electronic structure of a single step in the Thomas-Fermi approximation and find that the transmission coefficient through the step is exponentially suppressed by the electric field and the induced carrier density as well as by the step height. In addition, the field enhancement at the step edge can facilitate the electric breakthrough of the insulating layer. We suggest that these two effects may lead to severe problems when engineering FET devices with very high doping. On the other hand steps can give rise to interesting physics in superconducting FETs by forming weak links and potentially creating atomic size Josephson junctions.
@article{arxiv.cond-mat/0312441,
title = {Interface steps in field effect devices},
author = {S. Wehrli and C. Helm},
journal= {arXiv preprint arXiv:cond-mat/0312441},
year = {2009}
}