English

Electrostatically defined Quantum Dots in a Si/SiGe Heterostructure

Mesoscale and Nanoscale Physics 2015-05-19 v1 Materials Science Quantum Physics

Abstract

We present an electrostatically defined few-electron double quantum dot (QD) realized in a molecular beam epitaxy grown Si/SiGe heterostructure. Transport and charge spectroscopy with an additional QD as well as pulsed-gate measurements are demonstrated. We discuss technological challenges specific for silicon-based heterostructures and the effect of a comparably large effective electron mass on transport properties and tunability of the double QD. Charge noise, which might be intrinsically induced due to strain-engineering is proven not to affect the stable operation of our device as a spin qubit. Our results promise the suitability of electrostatically defined QDs in Si/SiGe heterostructures for quantum information processing.

Keywords

Cite

@article{arxiv.1007.2404,
  title  = {Electrostatically defined Quantum Dots in a Si/SiGe Heterostructure},
  author = {A. Wild and J. Sailer and J. Nützel and G. Abstreiter and S. Ludwig and D. Bougeard},
  journal= {arXiv preprint arXiv:1007.2404},
  year   = {2015}
}

Comments

20 pages, 8 figures

R2 v1 2026-06-21T15:48:09.797Z