相关论文: Deposition rate and energy to substrate in chopped…
High-power impulse magnetron sputtering (HiPIMS) offers considerable control over ion energy and flux, making it invaluable for tailoring the microstructure and properties of advanced functional coatings. However, compared to conventional…
High-power impulse magnetron sputtering (HiPIMS) delivers a high target power in short pulses, enhancing the ionization and energy of sputtered atoms and providing thus more possibilities to control the film properties. This study explores…
The effect of applying a positive voltage pulse (Urev = 10 - 150 V) directly after the negative high power impulse magnetron sputtering (HiPIMS) pulse (bipolar HiPIMS) is investigated for the reactive sputter deposition of TiN thin films.…
Deposition of thin films that are resistant to aggressive environment conditions, using the High-power impulse magnetron sputtering (HIPIMS) technique, represents a technological challenge. To establish the optimal operating conditions it…
In order to improve the quality of thin film deposition by magnetron discharges, particularly by an effective ionization of the sputtered vapor, we developed an ionized physical vapor deposition method based on pre-ionized pulsed magnetron…
We present a comparative study of copper film growth with a constant energy neutral beam, thermal evaporation, dc magnetron sputtering, high-power impulse magnetron sputtering (HiP-IMS), and bipolar HiPIMS, through molecular dynamics…
A simple and cost effective approach to stabilize the sputtering process in the transition zone during reactive high-power impulse magnetron sputtering (HiPIMS) is proposed. The method is based on real-time monitoring and control of the…
The transport of sputtered species from the target of a magnetron plasma to a collecting surface at the circumference of the plasma is analyzed using a particle tracer technique. A small chromium insert at the racetrack position inside a…
The discharges in high power impulse magnetron sputtering (HiPIMS) have been reported to consist of azimuthally inhomogeneous plasma with locally increased light emission. The luminous zones seemingly travel around the racetrack and are…
The quality of high-power impulse magnetron sputtering (HiPIMS) deposited films can often improve through the effective use of metal-ion acceleration, requiring precise measurements of time-of-flight (ToF). These measurements are commonly…
We explore the effect of ionization fraction on the epitaxial growth of Cu film on Cu (111) substrate at room temperature. We compare thermal evaporation, dc magnetron sputtering (dcMS) and high power impulse magnetron sputtering (HiPIMS).…
The growth rate during reactive high power pulsed magnetron sputtering (HIPIMS) of titanium nitride is measured with a temporal resolution of up to 25 us using a rotating shutter concept. According to that concept a 200 um slit is rotated…
High power pulsed magnetron sputtering (HPPMS) plasmas are pulsed discharges where the plasma composition as well as the fluxes and energies of ions are changing during the pulse. The time resolved energy distribution for Ar$^{1+}$ ions was…
HiPIMS plasmas generate energetic metal ions at the substrate as a major difference to conventional direct current magnetron sputtering. The origin of these ions is still an open issue, which is unraveled by using two fast diagnostics: time…
We experimentally investigate the impact of pulse shape on the dynamics of laser-generated plasma in rare gases. Fast-rising triangular pulses with a slower decay lead to early ionization of the air and depose energy more efficiently than…
This paper presents a Dynamic Internal Predictive Power Scheduling (DIPPS) approach for optimizing power management in microgrids, particularly focusingon external power exchanges among diverse prosumers. DIPPS utilizes a dynamic objective…
We investigated the transport titanium ions produced in a reactive high-power impulse magnetron sputtering (HiPIMS) device used for TiN coating deposition. Time-resolved mass spectrometry measurements of ionized sputtered atoms correlated…
Direct laser acceleration of ions by short frequency-chirped laser pulses is investigated theoretically. We demonstrate that intense beams of ions with a kinetic energy broadening of about 1 % can be generated. The chirping of the laser…
Spark plasma sintering (SPS) technique is applied in combination with hydrogen decrepitation process for the recycling of SmCo5 magnets. The SmCo5 magnets for recycling were first decrepitated by hydrogen gas of a pressure of 4 bar for 3…
Magnetron sputtering discharges feature complex magnetic field configurations to confine the electrons close to the cathode surface. This magnetic field configuration gives rise to a strong electron drift in azimuthal direction, with…