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相关论文: Engineering ferroelectricity in monoclinic hafnia

200 篇论文

Films of all-important compound hafnia (HfO2) can be prepared in an orthorhombic ferroelectric (FE) state that is ideal for applications, e.g. in memories or negative-capacitance field-effect transistors. The origin of this FE state remains…

材料科学 · 物理学 2020-07-15 Sangita Dutta , Hugo Aramberri , Tony Schenk , Jorge Íñiguez

Ferroelectricity in binary oxides including hafnia and zirconia have riveted the attention of the scientific community due to highly unconventional physical mechanisms and the potential for integration of these materials into semiconductor…

In contrast to hafnia (HfO2) thin films, where the appearance of switchable ferroelectric polarization can be induced by strain or defect engineering, reliable methods for controlling ferroelectricity are absent in HfO2 nanoparticles.…

材料科学 · 物理学 2026-02-27 Anna N. Morozovska , Eugene A. Eliseev , Richard , Liu , Sergei V. Kalinin , Dean R. Evans

The wake-up phenomenon widely exists in hafnia-based ferroelectric capacitors, which causes device parameter variation over time. Crystallization at higher temperatures have been reported to be effective in eliminating wake-up, but high…

Because of its compatibility with semiconductor-based technologies, hafnia (HfO$_{2}$) is today's most promising ferroelectric material for applications in electronics. Yet, knowledge on the ferroic and electromechanical response properties…

Hafnia-based ferroelectrics have become a valuable class of electronic functional materials at the nanoscale, showing great potential for next-generation memory and logic devices. However, more robust ferroelectric properties and better…

The discovery of ferroelectricity in both pure and doped HfO$_2$-based thin films have revitalized the interest in using ferroelectrics for nanoscale device applications. To take advantage of this silicon-compatible ferroelectric,…

材料科学 · 物理学 2019-05-22 Shi Liu , Brendan M Hanrahan

The persistent and switchable polarization of ferroelectric materials based on HfO$_2$-based ferroelectric compounds, compatible with large-scale integration, are attractive synaptic elements for neuromorphic computing. To achieve a record…

硬件体系结构 · 计算机科学 2023-09-22 Laura Bégon-Lours , Mattia Halter , Youri Popoff , Zhenming Yu , Donato Francesco Falcone , Bert Jan Offrein

The discovery of ferroelectricity in HfO$_2$-based thin films opens up new opportunities for using this silicon-compatible ferroelectric to realize low-power logic circuits and high-density non-volatile memories. The functional performances…

材料科学 · 物理学 2021-02-03 Jing Wu , Yuzhi Zhang , Linfeng Zhang , Shi Liu

Antiferroelectricity is a material property characterized by alternating electric dipoles spontaneously ordered in antiparallel directions. Antiferroelectrics are promising for energy storage, solid-state cooling, and memory technologies;…

The discovery of ferroelectric properties of binary oxides revitalized the interest in ferroelectrics and bridged the scaling gap between the state-of-the-art semiconductor technology and ferroelectric memories. However, before hitting the…

Ferroelectric HfO$_2$ has emerged as a highly promising material for high-density nonvolatile memory and nanoscale transistor applications. However, the uncertain origin of polarization in HfO$_2$ limits our ability to fully understand and…

材料科学 · 物理学 2026-03-11 Seongjoo Jung , Turan Birol

Neuromorphic computing, inspired by biological intelligence, offers a pathway to revolutionize artificial intelligence (AI) by unifying memory and processing in an energy-efficient, sustainable framework for data-intensive tasks.…

材料科学 · 物理学 2025-09-10 Xinye Li , Sayani Majumdar

Two-dimensional ferroelectric materials are beneficial for power-efficient memory devices and transistor applications. Here, we predict out-of-plane ferroelectricity in a new family of buckled metal oxide (MO; M: Ge, Sn, Pb) monolayers with…

应用物理 · 物理学 2024-10-28 Ateeb Naseer , Musaib Rafiq , Somnath Bhowmick , Amit Agarwal , Yogesh Singh Chauhan

In the realm of ferroelectric memories, HfO2-based ferroelectrics stand out because of their exceptional CMOS compatibility and scalability. Nevertheless, their switchable polarization and switching speed are not on par with those of…

Hafnia (HfO2) is a silicon-compatible dielectric material, yet stabilizing its desired but metastable ferroelectric phase remains challenging. Phase stability predictions by density functional theory (DFT) have provided crucial guidance,…

材料科学 · 物理学 2026-04-21 Yiheng Shen , Chang Liu , Wei Xie , Wei Ren

Different dopants with their specific dopant concentration can be utilized to produce ferroelectric HfO$_2$ thin films. In this work it is explored for the example of Sr in a comprehensive first-principles study. Density functional…

材料科学 · 物理学 2017-08-28 Robin Materlik , Christopher Künneth , Thomas Mikolajick , Alfred Kersch

Low dimensional ferroelectrics are highly desired for applications and full of exotic physics. Here a functionalized MXene Hf$_2$CF$_2$ monolayer is theoretically studied, which manifests a nonpolar to polar transition upon moderate biaxial…

材料科学 · 物理学 2021-11-17 Ziwen Wang , Ning Ding , Churen Gui , Shanshan Wang , Ming An , Shuai Dong

The structural, thermal, and dielectric properties of the ferroelectric phase of HfO$_2$, ZrO$_2$ and Hf$_{0.5}$ Zr$_{0.5}$ O$_2$ (HZO) are investigated with carefully validated density functional computations. We find, that the free bulk…

材料科学 · 物理学 2015-07-03 Robin Materlik , Christopher Künneth , Alfred Kersch

We clarify the nature of hafnia as a proper ferroelectric and show that there is a shallow double well involving a single soft polar mode as in well-known classic ferroelectrics. Using symmetry analysis, density-functional theory (DFT)…

材料科学 · 物理学 2023-07-27 Aldo Raeliarijaona , R. E. Cohen