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We present results of a fabrication-process development for the lithographic pattern transfer into the sub-100nm range by combining electron-beam lithography and reactive dry etching to obtain high quality niobium-based light-sensitive…

介观与纳米尺度物理 · 物理学 2010-11-23 H. Bartolf , K. Inderbitzin , L. B. Gómez , A. Engel , A. Schilling , H. -W. Hübers , A. Semenov , K. Il'in , M. Siegel

We performed comparative experimental investigation of superconducting NbN nanowires which were prepared by means of positive-and negative electron-beam lithography with the same positive tone Poly-methyl-methacrylate (PMMA) resist. We show…

We report on the effect of ambient gas on the contrast and the resolution of electron beam lithography (EBL) in gaseous environments on insulating substrates. Poly(methyl methacrylate) (PMMA) films were exposed in an environmental scanning…

介观与纳米尺度物理 · 物理学 2025-05-07 Deepak Kumar , Cooper Meyers , RJ Smith , J. Todd Hastings

Pattern transfer by deep anisotropic etch is a well-established technique for fabrication of nanoscale devices and structures. For this technique to be effective, the resist material plays a key role and must have high resolution,…

We demonstrate experimentally a precise realization of Coulomb Blockade Thermometry (CBT) working at temperatures up to 60 K. Advances in nano fabrication methods using electron beam lithography allow us to fabricate a uniform arrays of…

介观与纳米尺度物理 · 物理学 2017-01-20 M. Meschke , A. Kemppinen , J. P. Pekola

A simple and low cost apparatus has been designed and built to measure the electrical resistivity, ($\rho$), of metal and semiconductors in 300-620 K temperature range. The present design is suitable to do measurement on rectangular bar…

综合物理 · 物理学 2017-04-14 Saurabh Singh , Sudhir K. Pandey

Granular nanostructure of electron beam resist had limited the ultimate resolution of electron beam lithography. We report a thermal process to achieve a uniform and homogeneous amorphous thin film of poly methyl methacrylate electron…

材料科学 · 物理学 2012-07-16 Nima Arjmandi , Liesbet Lagae , Gustaaf Borghs

The method of negative-tone-PMMA electron-beam lithography is investigated to improve the performance of nanowire-based superconducting detectors. Using this approach, the superconducting nanowire single-photon detectors (SNSPDs) have been…

应用物理 · 物理学 2019-05-22 Ilya Charaev , Andrew Dane , Akshay Agarwal , Karl K. Berggren

The branching ratio for the decay $K^+ \to \pi^+\nu\bar{\nu}$ is sensitive to new physics; the NA62 experiment will measure it to within about 10%. To reject the dominant background from channels with final state photons, the large-angle…

Much of the exotic functionality of prime interest in quantum materials emerges from structural and electronic ground states that can only be accessed at cryogenic temperatures. Understanding device operation therefore requires structural…

We report measurements of the zero-field resistivity in dilute 2D electron system in silicon at temperatures down to 35 mK. This extends the previously explored range of temperatures by almost an order of magnitude. On the metallic side,…

强关联电子 · 物理学 2007-05-23 S. V. Kravchenko , T. M. Klapwijk

Nanostructured topological insulators (TIs) have the potential to impact a wide array of condensed matter physics topics, ranging from Majorana physics to spintronics. However, the most common TI materials, the Bi$_2$Se$_3$ family, are…

We present a novel experimental design for high sensitivity measurements of the electrical resistance of samples at high pressures (0-6GPa) and high temperatures (300-1000K) in a 'Paris-Edinburgh' type large volume press. Uniquely, the…

材料科学 · 物理学 2016-01-25 Shlomi Matityahu , Moran Emuna , Eyal Yahel , Guy Makov , Yaron Greenberg

We present results of a planar process development based on the combination of electron-beam lithography and dry etching for fabricating high-quality superconducting photosensitive structures in the sub-100nm regime. The devices were…

介观与纳米尺度物理 · 物理学 2010-11-23 H. Bartolf , K. Inderbitzin , L. B. Gómez , A. Engel , A. Schilling

In low temperature experiments, resins have many applications as glues or thermal and electrical insulators. Cyanate ester resins (CEs) are a high-temperature compatible thermoset resin whose glass-transition temperature $T_g$ is ~300…

The measurement of $BR(K^+\to\pi^+\nu\bar{\nu})$ with 10% precision by the NA62 experiment requires extreme background suppression. The Small Angle Calorimeter aims to provide an efficient veto for photons flying at angles down to zero with…

仪器与探测器 · 物理学 2016-10-13 A. Antonelli , F. Gonnella , V. Kozhuharov , M. Moulson , M. Raggi , T. Spadaro

We present a technique to fabricate ultrathin (down to 20 nm) uniform electron transparent windows at dedicated locations in a SiN membrane for in situ transmission electron microscopy experiments. An electron-beam (e-beam) resist is…

介观与纳米尺度物理 · 物理学 2017-09-14 M. Neklyudova , A. K. Erdamar , L. Vicarelli , S. J. Heerema , T. Rehfeldt , G. Pandraud , Z. Kolahdouz , C. Dekker , H. W. Zandbergen

The NA62 experiment at CERN utilises a differential Cherenkov counter with achromatic ring focus (CEDAR) for tagging kaons within an unseparated monochromatic beam of charged hadrons. The CEDAR-H detector was developed to minimise the…

高能物理 - 实验 · 物理学 2024-04-03 The NA62 Collaboration

We have studied the electronic properties of epitaxial graphene devices patterned in a meander shape with the length up to a few centimeters and the width of few tens of microns. These samples show a pronounced dependence of the resistance…

介观与纳米尺度物理 · 物理学 2017-03-21 G. Yu. Vasileva , D. Smirnov , Yu. B. Vasilyev , M. O. Nestoklon , N. S. Averkiev , S. Novikov , I. I. Kaya , R. J. Haug

Inelastic electron tunneling and surface-enhanced optical spectroscopies at the molecular scale require cryogenic local temperatures even under illumination - conditions that are challenging to achieve with plasmonically resonant metallic…

介观与纳米尺度物理 · 物理学 2017-04-05 Pavlo Zolotavin , Alessandro Alabastri , Peter Nordlander , Douglas Natelson
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