含分子添加剂的氙基光学时间投影室的微观模拟
仪器与探测器
2018-03-14 v2
摘要
我们引入了一个模拟框架，用于描述高能和低能电子在氙基气体光学时间投影室（OTPCs）中的输运过程。该模拟基于基本截面（电子-原子和电子-分子），并结合了氙的前41个激发态及相关准分子的反应/猝灭速率（原子-原子和原子-分子）及其辐射级联过程，以计算气体闪烁。模拟结果与在纯氙及其与CO和CF的混合物中，在0.1至10~bar压力范围内的观测结果吻合良好。这项工作揭示了在添加剂存在下，对OTPC技术具有重要意义的初级和次级氙闪烁机制的基本过程。
引用
@article{arxiv.1705.09481,
title = {Microscopic simulation of xenon-based optical TPCs in the presence of molecular additives},
author = {C. D. R. Azevedo and D. Gonzalez-Diaz and S. F. Biagi and C. A. B. Oliveira and C. A. O. Henriques and J. Escada and F. Monrabal and J. J. Gómez-Cadenas and V. Álvarez and J. M. Benlloch-Rodríguez F. I. G. M. Borges and A. Botas and S. Cárcel and J. V. Carrión and S. Cebrián and C. A. N. Conde and J. Díaz and M. Diesburg and R. Esteve and R. Felkai and L. M. P. Fernandes and P. Ferrario and A. L. Ferreira and E. D. C. Freitas and A. Goldschmidt and R. M. Gutiérrez and J. Hauptman and A. I. Hernandez and J. A. Hernando Morata and V. Herrero and B. J. P. Jones and L. Labarga and A. Laing and P. Lebrun and I. Liubarsky and N. Lopez-March and M. Losada and J. Martín-Albo and A. Martínez and A. D. McDonald and C. M. B. Monteiro and F. J. Mora and L. M. Moutinho and J. Muñoz Vidal and M. Musti and M. Nebot-Guinot and P. Novella and D. Nygren and B. Palmeiro and A. Para and J. Pérez and M. Querol and J. Renner and L. Ripoll and J. Rodríguez and L. Rogers and F. P. Santos and J. M. F. dos Santos and L. Serra and D. Shuman and A. Simón and C. Sofka and M. Sorel and T. Stiegler and J. F. Toledo and J. Torrent and Z. Tsamalaidze and J. F. C. A. Veloso and R. Webb and J. T. White and N. Yahlali},
journal= {arXiv preprint arXiv:1705.09481},
year = {2018}
}