English

Insulating behavior in ultra-thin bismuth selenide field effect transistors

Mesoscale and Nanoscale Physics 2012-01-19 v1 Materials Science

Abstract

Ultrathin (~3 quintuple layer) field-effect transistors (FETs) of topological insulator Bi2Se3 are prepared by mechanical exfoliation on 300nm SiO2/Si susbtrates. Temperature- and gate-voltage dependent conductance measurements show that ultrathin Bi2Se3 FETs are n-type, and have a clear OFF state at negative gate voltage, with activated temperature-dependent conductance and energy barriers up to 250 meV.

Keywords

Cite

@article{arxiv.1201.3908,
  title  = {Insulating behavior in ultra-thin bismuth selenide field effect transistors},
  author = {Sungjae Cho and Nicholas P. Butch and Johnpierre Paglione and Michael S. Fuhrer},
  journal= {arXiv preprint arXiv:1201.3908},
  year   = {2012}
}
R2 v1 2026-06-21T20:06:41.944Z