We introduce an in-situ characterization method of resists used for e-beam lithography. The technique is based on the application of an atomic force microscope which is directly mounted below the cathode of an electron-beam lithography system. We demonstrate that patterns irradiated by the e-beam can be efficiently visualized and analyzed in surface topography directly after the e-beam exposure. This in-situ analysis takes place without any development or baking steps, and gives access to the chemical (or latent) image of the irradiated resist.
@article{arxiv.1003.0796,
title = {In-situ direct visualization of irradiated e-beam patterns on unprocessed resists using atomic force microscopy},
author = {H. Koop and D. Schnurbusch and M. Mueller and T. Gruendl and M. Zech and M. -C. Amann and K. Karrai and A. W. Holleitner},
journal= {arXiv preprint arXiv:1003.0796},
year = {2015}
}