English

Nanomachining of multilayer graphene using an atomic force microscope

Mesoscale and Nanoscale Physics 2008-07-28 v1

Abstract

An atomic force microscope is used to structure a film of multilayer graphene. The resistance of the sample was measured in-situ during nanomachining a narrow trench. We found a reversible behavior in the electrical resistance which we attribute to the movement of dislocations. After several attempts also permanent changes are observed. Two theoretical approaches are presented to approximate the measured resistance.

Keywords

Cite

@article{arxiv.0807.4033,
  title  = {Nanomachining of multilayer graphene using an atomic force microscope},
  author = {P. Barthold and T. Luedtke and R. J. Haug},
  journal= {arXiv preprint arXiv:0807.4033},
  year   = {2008}
}

Comments

5 pages, 4 figures

R2 v1 2026-06-21T11:04:14.392Z