低温下硅中热流动力学的计算机模拟
材料科学
2007-08-31 v1 其他凝聚态物理
摘要
通过应用求解微分热扩散方程的计算机程序,研究了硅在 15 至 300 K 之间的热特性。该计算机模型通过一组实验数据与高纯硅相关联。数值结果以图形形式给出,特别显示了跨越长距离的极短扩散传输时间。计算结果需要实验验证;本文提出了一套测试装置。
引用
@article{arxiv.0708.4080,
title = {Computer simulated heat flow dynamics in Silicon at low temperatures},
author = {H. Diedrich and R. Liberati},
journal= {arXiv preprint arXiv:0708.4080},
year = {2007}
}
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8 pages, 5 figures
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