Related papers: Atomic layer etching of SiO$_2$ using sequential S…
Reliable and precise etching of silicon nanostructures with ultra-high aspect ratios is required in many fields. Metal assisted chemical etching (MacEtch) in vapor is a plasma-free etching method that attracts considerable attention owing…
Extensive efforts over the past number of years have been applied to develop workflows for sample preparation of specimens for atom probe tomography at cryogenic temperatures. This is primarily due to the difficulty involved in preparing…
A one dimensional Vlasov Poisson simulation code is employed to investigate the plasma sheath considering electron induced secondary electron emission (SEE) and backscattering. The SEE coefficient is commonly treated as constant in a range…
Due to its tunable band gap, anisotropic behavior, and superior thermoelectric properties, device applications using layered tellurene (Te) are becoming attractive. Here, we report a thinning technique for exfoliated tellurene nanosheets…
Many alloys made by Additive Manufacturing (AM) require careful design of post-heat treatment as an indispensable step of microstructure engineering to further enhance the performance. We developed a high-throughput approach by fabricating…
This study investigates the use of Atomic Layer deposition (ALD) to mitigate multipacting phenomena inside superconducting radio frequency (SRF) cavities used in particle accelerators. The unique ALD capability to control the film thickness…
Area-selective atomic layer deposition is a key technology for modern microelectronics as it eliminates alignment errors inherent to conventional approaches by enabling material deposition only in specific areas. Typically, the selectivity…
Electrochemical etching of silicon in hydrofluoride containing electrolytes leads to pore formation for low and to electropolishing for high applied current. The transition between pore formation and polishing is accompanied by a change of…
Simple high-performance two-stage hybrid technique was developed for fabrication of different plasmonic nanostructures, including nanorods, nanorings, as well as more complex structures on glass substrates. In this technique a thin noble…
Harmonic generation by an atom in a laser field is described by the three-step mechanism as proceeding via above-threshold ionization (ATI) followed by the electron propagation in the laser-dressed continuum and the subsequent laser…
Laser ablation through liquid is an important process that have to be studied for applications which use laser ablation in liquid (LAL) and laser shock peening (LSP). LAL is employed for production of suspensions of nanoparticles, while LSP…
Room-temperature 1535-nm-band photoluminescence in ~126 nm silica films (6 at. % doping), produced by spin-coating an Er2O3 and tetraethylorthosilicate sol-gel formulation on silicon substrates, was studied as a function of vacuum furnace…
Simulations and measurements on selective laser etching of display glasses are reported. By means of a holographic 3D beam splitter, ultrashort laser pulses are focused inside the volume of a glass sample creating type III modifications…
X-ray assisted nuclear excitation by electron capture (NEEC) into inner-shell atomic holes in a plasma environment generated by strong optical lasers is investigated theoretically. The considered scenario involves the interaction of a…
Over the recent years, there has been an extensive adoption of Machine Learning (ML) in a plethora of real-world applications, ranging from computer vision to data mining and drug discovery. In this paper, we utilize ML to facilitate…
Silicon, despite its abundance and high energy density, remains underexplored as a carbon-free fuel, with limited data available on its combustion characteristics. In this work, the combustion behaviour of silicon particles is examined…
The epitaxial synthesis of high-quality 2D layered materials is an essential driver of both fundamental physics studies and technological applications. Bi$_2$Se$_3$, a prototypical 2D layered topological insulator, is sensitive to defects…
We demonstrate active embedded microfluidic cooling in $\beta$-Ga$_2$O$_3$. We employ a cost-effective infra-red laser etch setup to achieve controlled etching of micro-channels in 500 um thick $\beta$-Ga$_2$O$_3$ substrate. The…
Advanced three-dimensional manufacturing techniques are triggering new paradigms in the way we design and produce sophisticated parts on demand. Yet, to fully unravel its potential, a few limitations have to be overcome, one of them being…
We demonstrate the extensive study on how film density and crystallinity of molybdenum carbide ($MoC_{x}$) can be tailored during plasma-enhanced ALD (PEALD) by controlling either the plasma exposure time or the ion energy. We investigated…