Related papers: EUV-induced Hydrogen Plasma : Pulsed Mode Operatio…
We use Raman spectroscopy to show that exposing few-layer graphene to extreme ultraviolet (EUV, 13.5 nm) radiation, i.e. relatively low photon energy, results in an increasing density of defects. Furthermore, exposure to EUV radiation in a…
We have used a combination of numerical modeling and experiments to study carbon etching in the presence of a hydrogen plasma. We model the evolution of a low density EUV-induced plasma during and after the EUV pulse to obtain the energy…
We propose a laser-controlled plasma shutter technique to generate sharp laser pulses using a process analogous to electromagnetically-induced transparency in atoms. The shutter is controlled by a laser with moderately strong intensity,…
Reflection at relativistically moving plasma mirrors is a well-known approach for frequency conversion as an alternative to nonlinear techniques. A key issue with plasma mirrors is the need for a high carrier concentration, of order 10^21…
The emission properties of tin plasmas, produced by the irradiation of preformed liquid tin targets by several-ns-long 2-$\mu$m-wavelength laser pulses, are studied in the extreme ultraviolet (EUV) regime. In a two-pulse scheme, a pre-pulse…
Plasma-based optics have emerged as a powerful platform for manipulating and amplifying ultra-intense laser pulses. However, the inherently nonlinear and dynamic nature of plasma leads to significant spatial, spectral, and temporal…
An extreme ultraviolet (EUV) single attosecond pulse passing through a laser-dressed dense gas is studied theoretically. The weak EUV pulse pumps the helium gas from the ground state to the 2s2p(1P) autoionizing state, which is coupled to…
We present a novel technique for in-vacuum cavity-enhanced UV spectroscopy that allows nearly continuous measurements over several days, minimizing mirror degradation caused by high-power UV radiation. Our method relies on pulsing of the…
A critical technology for high-volume manufacturing of nanoscale integrated circuits is a high-power extreme ultraviolet (EUV) light source. Over the past decades, laser-produced plasma (LPP) sources have been actively utilized in this…
Reaching light intensities above $10^{25}$ W/cm$^{2}$ and up to the Schwinger limit ($10^{29}$ W/cm$^{2}$) would enable testing decades-old fundamental predictions of Quantum Electrodynamics. A promising yet challenging approach to achieve…
The absence of efficient light modulators for extreme ultraviolet (EUV) and X-ray photons significantly limits their real-life application, particularly when even slight complexity of the beam patterns is required. Here we report on a novel…
A thin layer of overdense plasma is created when an electromagnetic pulse interacts with a rapidly ionizing thin foil. This layer will reflect the incoming pulse, forming a so-called plasma mirror. A simple realistic model based on paired…
We characterize the properties of extreme ultraviolet (EUV) light source plasmas driven by laser wavelengths in the $\lambda_{\mathrm{laser}} = 1.064 - 10.6 $ $\mu$m range. Detailed numerical simulations of laser-irradiated spherical tin…
The advent of ultrahigh-power femtosecond lasers creates a need for optical components suitable to handle ultrahigh light intensities. Due to the unavoidable laser-induced ionization of matter, these components will have to be based on a…
Self-diffraction is a non-collinear four-wave mixing technique well-known in optics. We explore self-diffraction in the extreme ultraviolet (EUV) range, taking advantage of intense femtosecond EUV pulses produced by a free electron laser.…
Negative hydrogen ion sources are used as injectors into accelerators and drive the neutral beam heating in ITER. Certain processes in low-temperature hydrogen plasmas are accompanied by the emission of vacuum ultraviolet (VUV) emission.…
Compressed ultrafast photography (CUP) is applied to laser breakdown in argon and xenon under pressures up to 40atm to obtain 2D images of the plasma dynamics of single events with a spatial resolution of 250x100 pixels and an equivalent…
Extreme ultraviolet (EUV) induced pulsed plasma is unique due to its transient characteristics: the plasma switches between non-thermal state (when EUV power is ON at the beginning of the pulse) and thermal state (end of the pulse at ~ 20…
Flying plasma mirrors induced by intense lasers has been proposed as a promising way to generate few-cycle EUV or X-ray lasers. In addition, if such a relativistic plasma mirror can accelerate, then it would serve as an analog black hole to…
In this paper we introduce a new diagnostic technique that uses prominence EUV and UV absorption to determine the prominence plasma electron temperature and column emission measure, as well as He/H relative abundance; if a realistic…