Related papers: High power fast pulsed magnetron discharges
Soft ferromagnetic NiFe thin films are promising for applications in spintronic devices because of their constituent electrical and magnetic properties. Electron beam evaporation and sputtering techniques have been used to deposit NiFe thin…
The processes of injection of a sputtered-and-ionized working material into the pulsed reflex discharge plasma have been considered at the initial stage of dense gas-metal plasma formation. A calculation model has been proposed to estimate…
The discharges in high power impulse magnetron sputtering (HiPIMS) have been reported to consist of azimuthally inhomogeneous plasma with locally increased light emission. The luminous zones seemingly travel around the racetrack and are…
Magnetrons are widely used as a high-efficiency, large-power, and low-cost microwave source. This article proposes a method to improve the magnetron output characteristics based on regulating its anode current by a novel active distortion…
A current approach to depositing highly plasmonic titanium nitride films using the magnetron sputtering technique assumes that the process is performed at temperatures high enough to ensure the atoms have sufficient diffusivities to form…
High power pulsed magnetron sputtering (HPPMS) plasmas are pulsed discharges where the plasma composition as well as the fluxes and energies of ions are changing during the pulse. The time resolved energy distribution for Ar$^{1+}$ ions was…
Epitaxial thin films of La0.7Ba0.3MnO3 manganite, deposited using Chemical Solution Deposition technique, were irradiated by 200 MeV Ag+15 ions with a maximum ion dose up to 1x10^12 ions/cm2. Temperature- and magnetic field-dependent…
We demonstrated for the first time the production of highly polarized short-pulse positrons with a finite energy spread in accordance with a new scheme that consists of two-quantum processes, such as inverse Compton scatterings and…
We investigate electron transport and phase-breaking processes in thin titanium nitride (TiN) films of epitaxial quality. Previous studies show that a minute surface magnetic disorder significantly reduces the critical temperature…
The experimental research on the nature of diffusion by the Mo substrate atoms into the Ti and Cr deposited thin films is completed by the secondary ion-ion emission method. In [1], the initial stage of the Ti thin film on the Mo substrate…
We present a systematic study of the properties of TiN films by varying the deposition conditions in an ultra-high-vacuum reactive magnetron sputtering chamber. By increasing the deposition pressure from 2 to 9 mTorr while keeping a nearly…
Sealed neutron tubes have a wide range of applications, and the ion source is their core component. Penning ion sources commonly suffer from issues such as uneven magnetic field distribution and a low proportion of monoatomic ions.…
The evaporation of drops of water placed at the center of long poly(methyl methacrylate) microfluidic channels with a rectangular cross section of 0.38 mm2 is studied by simultaneously monitoring the shapes of two samples, one is in a 300…
We present recent achievement on manufacturing optical filter and multilayers done with two complementary RF magnetron sputtering approaches: deposition duration control and in situ optical reflectance monitoring. Those approaches were…
We present an efficient method to produce laser-triggered proton pulses well below 500 ps pulse width at keV energies. We use femtosecond photoelectron pulses emitted from a cathode to enable ultrafast electron-stimulated desorption of…
Deposition of thin films that are resistant to aggressive environment conditions, using the High-power impulse magnetron sputtering (HIPIMS) technique, represents a technological challenge. To establish the optimal operating conditions it…
The powerful EHF radiation generated in a relativistic high-voltage pulsed magnetron of the 8 mm range is experimentally investigated. The factors that negatively affect the generation of EHF radiation are experimentally investigated and…
Al-doped ZnO thin films were deposited using reactive high power impulse magnetron sputtering at substrate temperatures between room temperature and 600 $\bullet$ C. Two sample series with different oxygen partial pressures were studied.…
Copper deposition has been carried out at various time span on glass slide and silicon substrate by using indigenously developed unbalanced type DC magnetron sputtering system. The main objective of this work is to study the crystalline…
Proposals to reach the next generation of laser intensities through Raman or Brillouin backscattering have centered on optical frequencies. Higher frequencies are beyond the range of such methods mainly due to the wave damping that…