Related papers: High power fast pulsed magnetron discharges
Magnetron sputtering is a widely used physical vapor deposition technique. Reactive sputtering is used for the deposition of, e.g, oxides, nitrides and carbides. In fundamental research, versatility is essential when designing or upgrading…
Ionized physical vapor deposition techniques, such as high-power impulse magnetron sputtering (HiPIMS) are gaining popularity due to their ability to produce high-quality thin films at low deposition temperatures. In those techniques, ions…
Micron-thick boron films have been deposited by Pulsed Laser Deposition in vacuum on several substrates at room temperature. The use of high energy pulses (>700 mJ) results in the deposition of smooth coatings with low oxygen uptake even at…
Optimized DC magnetron sputtering system for the deposition of transparent conductive oxides (TCOs), such indium tin oxide (ITO) on glass substrate has been applied in order to achieve low-emitting (low-e) transparent coatings. To obtain…
High-Power Impulse Magnetron Sputtering (HiPIMS) offers higher ionized flux fractions at the cost of lower deposition rates compared to conventional DCMS. A fine optimization of the deposition conditions is crucial for specific…
The effect of applying a positive voltage pulse (Urev = 10 - 150 V) directly after the negative high power impulse magnetron sputtering (HiPIMS) pulse (bipolar HiPIMS) is investigated for the reactive sputter deposition of TiN thin films.…
Discharges with crossed electric and magnetic fields are known to develop instabilities that are crucial in the transport of charged particles. Sputtering magnetrons are no exception. While most recent studies focused on traveling…
The ion energies and fluxes in the high power impulse magnetron sputtering plasma from a Nb target were analysed angularly resolved along the tangential direction of the racetrack. A reactive oxygen-containing atmosphere was used as such…
Magnetron sputtering is a perfect technique for processing nanomaterials for engineering and medical applications. A material can be processed with specific mechanical properties, microstructure, and surface texture by controlling the…
An experimental investigation was conducted to explore spectroscopic and structural characterization of semiconducting yttrium oxide thin film deposited at 623 K (+/- 5K) utilizing reactive pulsed direct current magnetron sputtering. Based…
In this work, the results of fabricating ultra thin VO$_2$ films on the technologically relevant amorphous SiO$_2$ surface using reactive DC magnetron sputtering are presented. Results indicate that a post deposition anneal in low partial…
In past decades, ultrafast spin dynamics in magnetic systems have been associated with heat deposition from high energy laser pulses, limiting the selective access to spin order. Here we use a long wavelength terahertz pump optical probe…
A simple and cost effective approach to stabilize the sputtering process in the transition zone during reactive high-power impulse magnetron sputtering (HiPIMS) is proposed. The method is based on real-time monitoring and control of the…
We present a comparative study of copper film growth with a constant energy neutral beam, thermal evaporation, dc magnetron sputtering, high-power impulse magnetron sputtering (HiP-IMS), and bipolar HiPIMS, through molecular dynamics…
We have carried out a detailed programme to explore the superconducting characteristics of reactive DC-magnetron sputtered NbN. The basic principle is to ignite a plasma using argon, and then to introduce a small additional nitrogen flow to…
We have carried out a detailed programme to explore the superconducting characteristics of reactive DC-magnetron sputtered NbN. The basic principle is to ignite a plasma using argon, and then to introduce a small additional nitrogen flow to…
We report the existence of an enhanced operating regime for a high-frequency, low-pressure capacitively coupled plasma (CCP) discharge in the presence of a weak magnetic field applied parallel to the electrodes. Our PIC-MCC simulations show…
Thin films of the recently discovered magnesium diboride (MgB2) intermetalic superconducting compound have been grown using a magnetron sputtering deposition technique followed by in-situ annealing at 830 C. High quality films were obtained…
This paper reports on the deposition of amorphous and crystalline thin films of Ga2O3 by reactive pulsed direct current magnetron sputtering from a liquid gallium target onto fused (f-) quartz and c plane (c-) sapphire substrates, where the…
Compact spin-polarized positron accelerators play a major role in promoting significant positron application research, which typically require high acceleration gradients and polarization degree, both of which, however, are still great…