The experimental research on the nature of diffusion by the Mo substrate atoms into the Ti and Cr deposited thin films is completed by the secondary ion-ion emission method. In [1], the initial stage of the Ti thin film on the Mo substrate deposition process, using the Ti evaporation technique in the vacuum, is researched. It was found that the Mo substrate atoms diffuse into the continuously deposited Ti thin film. The diffusion of Mo substrate atoms by the nodes of crystal grating in the deposited metallic Ti thin film with the continuously increasing thickness is theoretically considered in [2]. In this research, the diffusion coefficients of Mo substrate atoms into the Ti and Cr thin films are measured by the secondary ion-ion emission method in the Mo-Ti and Mo-Cr systems.
@article{arxiv.1209.4750,
title = {Research on diffusion of Mo substrate atoms into Ti and Cr thin films by secondary ion-ion emission method},
author = {A. D. Abramenkov and Ya. M. Fogel and V. V. Slyozov and L. V. Tanatarov and Oleg P. Ledenyov},
journal= {arXiv preprint arXiv:1209.4750},
year = {2012}
}