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Simulations of light scattering off an extreme ultraviolet lithography mask with a 2D-periodic absorber pattern are presented. In a detailed convergence study it is shown that accurate results can be attained for relatively large 3D…

Optics · Physics 2011-05-31 S. Burger , L. Zschiedrich , J. Pomplun , F. Schmidt

This paper introduces a novel pipeline to enhance the precision of object masking for robotic manipulation within the specific domain of masking products in convenience stores. The approach integrates two advanced AI models, CLIP and SAM,…

Robotics · Computer Science 2025-03-03 Muhammad A. Muttaqien , Tomohiro Motoda , Ryo Hanai , Domae Yukiyasu

We demonstrate the use of frequency-encoded light masks in neutral atom lithography. We demonstrate that multiple features can be patterned across a monotonic potential gradient. Features as narrow as 0.9 microns are fabricated on silicon…

Atomic Physics · Physics 2009-11-07 J. H. Thywissen , M. Prentiss

We fabricate and characterize a microscale silicon electro-opto-mechanical system whose mechanical motion is coupled capacitively to an electrical circuit and optically via radiation pressure to a photonic crystal cavity. To achieve large…

Face masks provide effective, easy-to-use, and low-cost protection against airborne pathogens or infectious agents, including SARS-CoV-2. There is a wide variety of face masks available on the market for various applications, but they are…

Signal Processing · Electrical Eng. & Systems 2020-09-17 Naren Vikram Raj Masna , Rohan Reddy Kalavakonda , Reiner Dizon , Anamika Bhuniaroy , Soumyajit Mandal , Swarup Bhunia

We report our work on fabricating lithographically aligned patterned backgates on thin (50-60$\mu$m) \Roman{roman3}-\Roman{roman5} semiconductor samples using {\it single sided mask aligners only}. Along with this we also present a way to…

Mesoscale and Nanoscale Physics · Physics 2009-11-13 A. F. Croxall , K. Das Gupta , C. A. Nicoll , M. Thangaraj , I. Farrer , D. A. Ritchie , M. Pepper

We propose Mask Auto-Labeler (MAL), a high-quality Transformer-based mask auto-labeling framework for instance segmentation using only box annotations. MAL takes box-cropped images as inputs and conditionally generates their mask…

Computer Vision and Pattern Recognition · Computer Science 2023-01-11 Shiyi Lan , Xitong Yang , Zhiding Yu , Zuxuan Wu , Jose M. Alvarez , Anima Anandkumar

A custom-built mask aligner (CBMA), which fundamentally covers all the key features of a commercial mask aligner, while being low cost, light weight, and having low power consumption and high accuracy is constructed. The CBMA is comprised…

Applied Physics · Physics 2018-08-23 Quang Long Pham , Nhat-Anh N. Tong , Austin Mathew , Roman S. Voronov

The center-of-mass motion of optically trapped dielectric nanoparticles in vacuum is extremely well-decoupled from its environment, making a powerful tool for measurements of feeble sub-attonewton forces. We demonstrate a method to trap and…

Fast production of large area patterns with nanometre resolution is crucial for the established semiconductor industry and for enabling industrial-scale production of next-generation quantum devices. Metastable atom lithography with binary…

Machine Learning · Computer Science 2022-07-19 Johannes Fiedler , Adrià Salvador Palau , Eivind Kristen Osestad , Pekka Parviainen , Bodil Holst

Lattice arrays have been shown to have great value as simulators for complicated mathematical problems. In all physical lattices so far, coupling is only between nearest neighbors or nearest plus next-nearest neighbors; the geometry of the…

This paper shows that masked autoencoders (MAE) are scalable self-supervised learners for computer vision. Our MAE approach is simple: we mask random patches of the input image and reconstruct the missing pixels. It is based on two core…

Computer Vision and Pattern Recognition · Computer Science 2021-12-21 Kaiming He , Xinlei Chen , Saining Xie , Yanghao Li , Piotr Dollár , Ross Girshick

Nanofabrication techniques for superconducting qubits rely on resist-based masks patterned by electron-beam or optical lithography. We have developed an alternative nanofabrication technique based on free-standing silicon shadow masks…

A rigorous analytical study of the eigenmodes supported by a charge accumulation layer within a transparent conductive oxide (TCO) is presented. The new class of surface plasmons termed Accumulation-Layer Surface Plasmon (ASP) is…

Optics · Physics 2017-05-15 Shima Fardad , E. Alexander Ramos , Alessandro Salandrino

Masked Autoencoders (MAE) based on a reconstruction task have risen to be a promising paradigm for self-supervised learning (SSL) and achieve state-of-the-art performance across different benchmark datasets. However, despite its impressive…

Machine Learning · Computer Science 2023-03-28 Qi Zhang , Yifei Wang , Yisen Wang

This paper reports on the design and construction of a chamber for the muon identifier detector (MID) of the ALICE 3 upgrade project. The chamber consists of two sensitive layers separated by a 1 cm air gap. Each layer holds 24 scintillator…

We report the development of a multileaf collimator (MLC) for charged particle beams, based on independently actuated tungsten strips which can selectively scatter unwanted particles. The MLC is used in conjunction with an emittance…

We perform a comparative study of the neutralino dark matter scattering on nucleon in three popular supersymmetric models: the minimal (MSSM), the next-to-minimal (NMSSM) and the nearly minimal (nMSSM). First, we give the predictions of the…

High Energy Physics - Phenomenology · Physics 2010-07-14 Junjie Cao , Ken-ichi Hikasa , Wenyu Wang , Jin Min Yang , Li-Xin Yu

We present a fully automated system for sizing nasal Positive Airway Pressure (PAP) masks. The system is comprised of a mix of HOG object detectors as well as multiple convolutional neural network stages for facial landmark detection. The…

Computer Vision and Pattern Recognition · Computer Science 2018-11-12 Benjamin Johnston , Philip de Chazal
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