Related papers: E-BLOW: E-Beam Lithography Overlapping aware Stenc…
The computational homogenization of elastoplastic polycrystals is a challenging task due to the huge number of grains required, their complicated interactions and due to the complexity of crystal plasticity models per se. Despite a few…
Optical lithography is the main enabler to semiconductor manufacturing. It requires extensive processing to perform the Resolution Enhancement Techniques (RETs) required to transfer the design data to a working Integrated Circuits (ICs).…
Elliptic curve cryptography (ECC) is widely used in security applications such as public key cryptography (PKC) and zero-knowledge proofs (ZKP). ECC is composed of modular arithmetic, where modular multiplication takes most of the…
Continuous scaling of the VLSI system leaves a great challenge on manufacturing and optical proximity correction (OPC) is widely applied in conventional design flow for manufacturability optimization. Traditional techniques conducted OPC by…
We report on parallel production of Bose-Einstein condensates (BECs) in steerable, multi-plexed crossed optical dipole traps. Using a conventional trap-weakening evaporation scheme, where the optical trapping power is lowered, we obtain an…
One significant drawback of a spectroscopic ellipsometry (SE) technique is its time-consuming and often complicated analysis procedure necessary to assess the optical functions of thin-film and bulk samples. Here, to solve this inherent…
The three scanning electron microscope diffraction based techniques of electron channelling patterns (ECPs), electron channelling contrast imaging (ECCI), and electron back scatter diffraction (EBSD) are reviewed. The dynamical diffraction…
This paper presents high-order (HO) electromagnetic modeling of plasmonic nanostructures based on the Locally Corrected Nystrom (LCN) method. Advanced nanophotonic and nanoplasmonic structures involve electrically large electromagnetic…
Obtaining accurate and timely channel state information (CSI) is a fundamental challenge for large antenna systems. Mobile systems like 5G use a beam management framework that joins the initial access, beamforming, CSI acquisition, and data…
Graph Convolutional Networks (GCNs) can capture non-Euclidean spatial dependence between different brain regions. The graph pooling operator, a crucial element of GCNs, enhances the representation learning capability and facilitates the…
Constraining the Epoch of Reionization (EoR) with physically motivated simulations is hampered by the high cost of conventional parameter inference. We present an efficient emulator-based framework that dramatically reduces this bottleneck…
Good process-to-compute-node mappings can be decisive for well performing HPC applications. A special, important class of process-to-node mapping problems is the problem of mapping processes that communicate in a sparse stencil pattern to…
Block iterative methods are extremely important as smoothers for multigrid methods, as preconditioners for Krylov methods, and as solvers for diagonally dominant linear systems. Developing robust and efficient algorithms suitable for…
Multilayer metasurfaces provide substantially greater spectral design freedom than single-layer devices, yet their implementation in the visible and near-infrared remains limited by the complexity, cost, and low throughput of conventional…
We present a framework to use recently introduced Capsule Networks for solving the problem of Optical Flow, one of the fundamental computer vision tasks. Most of the existing state of the art deep architectures either uses a correlation…
Multi-beam ptychography (MBP) offers a scalable solution to improve the throughput of state-of-the-art ptychography by increasing the number of coherent beams that illuminate the sample simultaneously. However, increasing the number of…
Electron-beam (e-beam) lithography is widely employed in fabrication of 2-D patterns and 3-D structures. A certain type or shape of the sidewall in the remaining resist profile may be desired in an application, e.g., an undercut for…
Electron backscatter diffraction (EBSD) is a technique used to measure crystallographic features in the scanning electron microscope. The technique is highly automated and readily accessible in many laboratories. EBSD pattern indexing is…
The unprecedented dissemination of edge devices is accompanied by a growing demand for neuromorphic chips that can process time-series data natively without cloud support. Echo state network (ESN) is a class of recurrent neural networks…
We present results of a planar process development based on the combination of electron-beam lithography and dry etching for fabricating high-quality superconducting photosensitive structures in the sub-100nm regime. The devices were…