Related papers: Transparent yttrium hydride thin films prepared by…
Heteroepitaxial growth of selected group IV-VI nitrides on various orientations of sapphire (\alpha-Al2O3) is demonstrated using atomic layer deposition. High quality, epitaxial films are produced at significantly lower temperatures than…
We report on magnetron deposition of thin superconducting rhenium films on sapphire substrates. During the deposition, substrates were held at ambient temperature. Critical temperature of the films is Tc~3.6 K. Films have polycrystalline…
The applicability of standard methods for compositional analysis is limited for H-containing films. Neutron reflectometry is a powerful, non-destructive method that is especially suitable for these systems due to the large negative…
When exposed to air, metallic yttrium dihydride YH2films turn into insulating and transparent yttrium oxy-hydride (YHO). The incorporation of oxygen causes the lattice expansion of YH2 and the emergence of photochromic properties. However,…
This paper reports on the deposition of amorphous and crystalline thin films of Ga2O3 by reactive pulsed direct current magnetron sputtering from a liquid gallium target onto fused (f-) quartz and c plane (c-) sapphire substrates, where the…
Thin films of a nominal Fe2CrSi alloy have been deposited by magnetron co-sputtering with various heat treatments on MgO and MgAl2O4 substrates. After heat treatment, the films were found to decompose into a nearly epitaxial Fe3Si film with…
Recently was reported a novel compound between rhenium and nitrogen, announced with ReN2 composition. This compound was synthesized by the high temperature and high pressure method. We found that the diffraction peaks of this compound are…
This paper reports on the deposition and photoluminescence of amorphous and crystalline thin films of zinc gallium oxide with Ga:Zn atomic ratio varied between 0.3 and 5.7. The films are prepared by reactive direct current magnetron…
Optimized DC magnetron sputtering system for the deposition of transparent conductive oxides (TCOs), such indium tin oxide (ITO) on glass substrate has been applied in order to achieve low-emitting (low-e) transparent coatings. To obtain…
We report on controlled growth of photochromic yttrium oxyhydride thin films monitored by $\textit{in-situ}$ composition depth profiling. Films were grown by reactive $e^-$-beam evaporation and subsequently oxidized, while simultaneously…
Thin films of phase pure pyrochlore Gd2Ti2O7 have been synthesized by RF magnetron sputtering. The films were prepared from oxide targets in 50%O2/Ar atmosphere and deposited on 111 YSZ substrates at a temperature of 800C. The pyrochlore…
Thin films of the recently discovered magnesium diboride (MgB2) intermetalic superconducting compound have been grown using a magnetron sputtering deposition technique followed by in-situ annealing at 830 C. High quality films were obtained…
High–quality epitaxial YNixMn1-xO3 thin films have been successfully grown on SrTiO3 (100) (STO) by pulsed laser deposition. X-ray diffraction studies showed that the films deposited on STO are fully c-axis oriented and exhibit…
Unlike other switchable mirrors, Mg2NiHx films show large changes in reflection that yield very low reflectance (high absorptance) at different hydrogen contents, far before reaching the semiconducting state. The resulting reflectance…
Transition metal nitrides have received significant interest for use within plasmonic and optoelectronic devices. However, deposition temperature remains a significant barrier to the integration of transition metal nitrides as plasmonic…
Different thicknesses of cobalt thin films were growth by magnetron sputtering deposition techniques. The films thicknesses were determinated with X ray Photoelectron Spectroscopy (XPS) and Quartz Crystal Monitoring (QCM). XPS is also used…
Yttrium iron garnet (YIG) is a prototypical material in spintronics due to its exceptional magnetic properties. To exploit these properties high quality thin films need to be manufactured. Deposition techniques like sputter deposition or…
Controlling the crystalline structure of Hafnium Zirconate and its epitaxial relationship to a semiconducting electrode has a high technological interest, as ferroelectric materials are key ingredients for emerging electronic devices. Using…
We propose a way of formation of thin bilayer Pt$_3$Si/Pt$_2$Si films at room temperature on poly-Si substrates by Pt magnetron sputtering and wet etching, obtain such film, investigate its structure and phase composition and estimate the…
Thin aluminum oxide films were deposited by a new and simple physicochemical method called chemical liquid phase deposition (CLD) on semiconductor materials. Aluminum sulfate with crystallized water and sodium bicarbonate were used as…