English

Universality in Shape Evolution of Si$_{1-x}$Ge$_{x}$ Structures on High Index Silicon Surfaces

Materials Science 2012-10-08 v1 Mesoscale and Nanoscale Physics

Abstract

The MBE grown Si1x_{1-x}Gex_x islands on reconstructed high index surfaces, such as, Si(5 5 12), Si(5 5 7) and Si(5 5 3) show a universality in the shape evaluation and the growth exponent parameters, \emph{irrespective} of the substrate orientations and size of the island structures. This phenomena has been explained by incorporating a deviation parameter (ϵ\epsilon) to the surface barrier term (EDE_D) in the kinematic Monte Carlo (kMC) simulations as one of the plausible mechanisms.

Keywords

Cite

@article{arxiv.1204.0578,
  title  = {Universality in Shape Evolution of Si$_{1-x}$Ge$_{x}$ Structures on High Index Silicon Surfaces},
  author = {J. K. Dash and T. Bagarti and A. Rath and R. R. Juluri and P. V. Satyam},
  journal= {arXiv preprint arXiv:1204.0578},
  year   = {2012}
}

Comments

4 pages, 5 figures