Photonic integration of lithium niobate micro-ring resonators onto silicon nitride waveguide chips by transfer-printing
Abstract
The heterogeneous integration of lithium niobate photonic waveguide devices onto a silicon nitride waveguide platform via a transfer-printing approach has been demonstrated for the first time. A fabrication process was developed to make free-standing lithium niobate membrane devices compatible with back-end integration onto photonic integrated circuits. Micro-ring resonators in membrane format were lithographically defined by using laser direct writing and plasma dry etching. The lithium niobate micro-ring resonators were then transferred from their host substrate and released onto a silicon nitride waveguide chip. An all-pass ring resonator transmission spectrum was obtained in the 1.5 {\mu}m to 1.6 {\mu}m wavelength range, with a measured loaded Q-factor larger than 32000.
Keywords
Cite
@article{arxiv.2208.12192,
title = {Photonic integration of lithium niobate micro-ring resonators onto silicon nitride waveguide chips by transfer-printing},
author = {Zhibo Li and Jack A. Smith and Mark Scullion and Nils Kolja Wessling and Loyd J. McKnight and Martin D. Dawson and Michael J. Strain},
journal= {arXiv preprint arXiv:2208.12192},
year = {2023}
}
Comments
8 pages, 6 figures