Ironsilicide formation by high temperature codeposition of Fe-2Si with different thicknesses on Si (111)

I. Dézsi; Cs. Fetzer; F. Tanczikó; P. B. Barna; O. Geszti; G. Sáfrán; L. Székely

Ironsilicide formation by high temperature codeposition of Fe-2Si with different thicknesses on Si (111)

Materials Science 2011-09-23 v1

Authors: I. Dézsi , Cs. Fetzer , F. Tanczikó , P. B. Barna , O. Geszti , G. Sáfrán , L. Székely

Abstract

Fe and 2Si were co-deposited on Si (111) surface at 853 K. The formation of silicides was investigated by Mossbauer spectroscopy and electron microscopy. Depending on the thickness of the deposited films different phases were formed. At low thickness, stable $\epsilon$ -FeSi (B20) and metastable [CsCl]-Fe $_{1-x}$ Si (B2) phases were observed. In the latter case, because of the presence of Fe vacancies in the lattice the local symmetry around the iron components was lower than cubic. At larger (12 nm) deposited thickness, stable $\beta$ -FeSi $_2$ has been formed.

Keywords

ironsilicide formation high temperature codeposition Si (111) Mossbauer spectroscopy electron microscopy Fe vacancies phase stability

Cite

@article{arxiv.1109.4825,
  title  = {Ironsilicide formation by high temperature codeposition of Fe-2Si with different thicknesses on Si (111)},
  author = {I. Dézsi and Cs. Fetzer and F. Tanczikó and P. B. Barna and O. Geszti and G. Sáfrán and L. Székely},
  journal= {arXiv preprint arXiv:1109.4825},
  year   = {2011}
}

Ironsilicide formation by high temperature codeposition of Fe-2Si with different thicknesses on Si (111)

Abstract

Keywords

Cite

Related papers