A high-entropy metal disilicide, (Mo0.2Nb0.2Ta0.2Ti0.2W0.2)Si2, has been successfully synthesized. X-ray diffraction (XRD), energy dispersive X-ray spectroscopy (EDX), and electron backscatter diffraction (EBSD) collectively show the formation of a single high-entropy silicide phase. This high-entropy (Mo0.2Nb0.2Ta0.2Ti0.2W0.2)Si2 possesses a hexagonal C40 crystal structure with ABC stacking sequence and a point group of P6222. This discovery expands the known families of high-entropy materials from metals, oxides, borides, carbides, and nitrides to a silicide, for the first time to our knowledge, as well as demonstrating that a new, non-cubic, crystal structure (with lower symmetry) can be made into high-entropy. This (Mo0.2Nb0.2Ta0.2Ti0.2W0.2)Si2 exhibits high nanohardness of 16.7 +- 1.9 GPa and Vickers hardness of 11.6 +- 0.5 GPa. Moreover, it has a low thermal conductivity of 6.9 +- 1.1 W m-1 K-1, which is approximately one order of magnitude lower than that of the widely-used tetragonal MoSi2 and ~1/3 of those reported values for the hexagonal NbSi2 and TaSi2 with the same crystal structure.
@article{arxiv.1902.01033,
title = {A High-Entropy Silicide: (Mo0.2Nb0.2Ta0.2Ti0.2W0.2)Si2},
author = {Joshua Gild and Jeffrey Braun and Kevin Kaufmann and Eduardo Marin and Tyler Harrington and Patrick Hopkins and Kenneth Vecchio and Jian Luo},
journal= {arXiv preprint arXiv:1902.01033},
year = {2019}
}