We propose a hybrid device consisting of a graphene/silicon (Gr/Si) Schottky diode in parallel with a Gr/SiO2/Si capacitor for high-performance photodetection. The device, fabricated by transfer of commercial graphene on low-doped n-type Si substrate, achieves a photoresponse as high as 3 AW^(-1) and a normalized detectivity higher than 3.5 10^12 cmHz^(1/2) W^(-1) in the visible range. The device exhibits a photocurrent exceeding the forward current, because photo-generated minority carriers, accumulated at Si/SiO2 interface of the Gr/SiO2/Si capacitor, diffuse to the Gr/Si junction. We show that the same mechanism, when due to thermally generated carriers, although usually neglected or disregarded, causes the increased leakage often measured in Gr/Si heterojunctions. At room temperature, we measure a zero-bias Schottky barrier height of 0.52 eV, as well as an effective Richardson constant A**=4 10^(-5) Acm^(-2) K^(-2) and an ideality factor n=3.6, explained by a thin (< 1nm) oxide layer at the Gr/Si interface.
@article{arxiv.1701.06541,
title = {Hybrid Graphene/Silicon Schottky photodiode with intrinsic gating effect},
author = {Antonio Di Bartolomeo and Giuseppe Luongo and Filippo Giubileo and Nicola Funicello and Gang Niu and Thomas Schroeder and Marco Lisker and Grzegorz Lupina},
journal= {arXiv preprint arXiv:1701.06541},
year = {2017}
}