English

Controlled growth of InAs nanowires on engineered substrates

Materials Science 2009-06-24 v1 Other Condensed Matter

Abstract

We demonstrate the Au-assisted growth of semiconductor nanowires on different engineered substrates. Two relevant cases are investigated: GaAs/AlGaAs heterostructures capped by a 50nm50 {\rm nm}-thick InAs layer grown by molecular beam epitaxy and a 2μm2 {\rm \mu m}-thick InAs buffer layer on Si(111) obtained by vapor phase epitaxy. Morphological and structural properties of substrates and nanowires are analyzed by atomic force and transmission electron microscopy. Our results indicate a promising direction for the integration of III-V nanostructures on Si-based electronics as well as for the development of novel micromechanical structures.

Keywords

Cite

@article{arxiv.0903.4146,
  title  = {Controlled growth of InAs nanowires on engineered substrates},
  author = {Stefano Roddaro and Philippe Caroff and Giorgio Biasiol and Francesca Rossi and Claudio Bocchi and Kristian Nilsson and Linus Fröberg and Jakob B. Wagner and Lars Samuelson and Lars-Erik Wernersson and Lucia Sorba},
  journal= {arXiv preprint arXiv:0903.4146},
  year   = {2009}
}

Comments

5 pages, 5 figures, suppl.mat

R2 v1 2026-06-21T12:43:56.240Z