Using direct-write atom lithography, Fe nanolines are deposited with a pitch of 186 nm, a full width at half maximum (FWHM) of 50 nm, and a height of up to 6 nm. These values are achieved by relying on geometrical collimation of the atomic beam, thus without using laser collimation techniques. This opens the way for applying direct-write atom lithography to a wide variety of elements.
Cite
@article{arxiv.0908.2733,
title = {Atom lithography without laser cooling},
author = {B. Smeets and P. van der Straten and T. Meijer and C. G. C. H. M. Fabrie and K. A. H. van Leeuwen},
journal= {arXiv preprint arXiv:0908.2733},
year = {2015}
}