English

A Field-Effect-Transistor from Graphite: No Effect of Low Gate Fields

Strongly Correlated Electrons 2007-05-23 v1

Abstract

Inspired by the striking similarities between the metal-insulator transitions in graphite and Si-MOSFET's and the recent attention to charge doping in carbon-based materials, we have made attempts to fabricate a field-effect transistor based on graphite. A relatively thick layer of boron nitride turned out to be able to serve as a gate dielectric. This, however, limits the achievable electric gate field, which might be the reason for our observation of no charge-doping effect.

Keywords

Cite

@article{arxiv.cond-mat/0304105,
  title  = {A Field-Effect-Transistor from Graphite: No Effect of Low Gate Fields},
  author = {H. Kempa and P. Esquinazi},
  journal= {arXiv preprint arXiv:cond-mat/0304105},
  year   = {2007}
}

Comments

3 pages, 3 figures, submitted to Europ. Phys. J. AP

R2 v1 2026-07-22T10:48:30.063Z