Three-dimensional visualization of threading dislocation in GaN by polarized-light microscopy
摘要
We demonstrate high-throughput three-dimensional imaging of threading dislocations in ammonothermal GaN wafers using polarized-light microscopy with collimated LED illumination. Threading dislocations exhibited focal-depth-dependent in-plane shifts, enabling visualization of their three-dimensional inclination behavior over large areas. Synchrotron radiation X-ray topography indicated that dislocations with identical in-plane Burgers vector components tended to exhibit similar trace geometries and inclination directions. The threading dislocations were found to be tilted by approximately 3.3{\deg} from the c-axis in directions perpendicular to their Burgers vectors, indicating climb-mediated motion associated with strain relaxation during crystal growth. These results demonstrate a simple nondestructive approach for large-area three-dimensional characterization of dislocations in GaN wafers.
引用
@article{arxiv.2606.27744,
title = {Three-dimensional visualization of threading dislocation in GaN by polarized-light microscopy},
author = {Yukari Ishikawa and Kisara Matsumoto and Kazuki Ohnishi and Yongzhao Yao},
journal= {arXiv preprint arXiv:2606.27744},
year = {2026}
}
备注
17 pages, 5 figures